Prof. Timothy A. Shedd Profile

Prof. Timothy A. Shedd

Assistant Professor at Florida Polytechnic Univ

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Author

Publications (12)

SPIE Journal Paper | 1 July 2008

Improved model for liquid loss at a dynamic contact line including behaviors of high-index fluids

Paul Harder, Timothy Shedd

JM3 Vol. 7 Issue 03

KEYWORDS: Liquids, Data modeling, Fluid dynamics, Thin films, Water, Semiconducting wafers, Microfluidics, Immersion lithography, Quartz, Velocity measurements

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Proceedings Article | 3 May 2007 Paper

Contact angles and liquid loss behavior of high index fluids

Paul Harder, Timothy Shedd

Proc. SPIE. 6533, 23rd European Mask and Lithography Conference

KEYWORDS: Thin films, Data modeling, Cameras, Water, Particles, High speed cameras, Immersion lithography, Semiconducting wafers, Fluid dynamics, Liquids

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SPIE Journal Paper | 1 April 2007

Prediction of the velocity at which liquid separates from a moving contact line

Scott Schuetter, Timothy Shedd, Gregory Nellis

JM3 Vol. 6 Issue 02

KEYWORDS: Liquids, Velocity measurements, Fluid dynamics, Capillaries, Image processing, Data modeling, Interfaces, Semiconducting wafers, Chromium, Microfluidics

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Proceedings Article | 20 October 2006 Paper

A model to predict the critical velocity for liquid loss from a receding meniscus

Timothy Shedd, Scott Schuetter, Gregory Nellis, Chris Van Peski

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Semiconductors, Microfluidics, Data modeling, Capillaries, Interfaces, Solids, Immersion lithography, Semiconducting wafers, Fluid dynamics, Liquids

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Proceedings Article | 21 June 2006 Paper

A correlation for predicting film-pulling velocity in immersion lithography

Scott Schuetter, Timothy Shedd, Keith Doxtator, Gregory Nellis, Chris Van Peski

Proc. SPIE. 6281, 22nd European Mask and Lithography Conference

KEYWORDS: Optical lithography, Capillaries, Image processing, Interfaces, Immersion lithography, Velocity measurements, Semiconducting wafers, Wafer testing, Fluid dynamics, Liquids

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Proceedings Article | 11 April 2006 Paper

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Andrew Romano, Guanyang Lin, Simon Chiu, Allen Timko, Frank Houlihan, Dalil Rahman, S. Chakrapani, T. Kudo, Ralph Dammel, Karen Turnquest, Georgia Rich, Scott Schuetter, Timothy Shedd, Gregory Nellis

Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII

KEYWORDS: Lithography, Polymers, Fourier transforms, Photoresist materials, Line width roughness, Immersion lithography, Line edge roughness, Thin film coatings, Photoresist processing, Semiconducting wafers

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SPIE Journal Paper | 1 April 2006

Measurements of the dynamic contact angle for conditions relevant to immersion lithography

Scott Schuetter, Timothy Shedd, Keith Doxtator, Gregory Nellis, Chris Van Peski, Andrew Grenville, Shang-Ho Lin, Dah-Chung Owe-Yang

JM3 Vol. 5 Issue 02

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Proceedings Article | 15 March 2006 Paper

Experimental characterization of the receding meniscus under conditions associated with immersion lithography

Timothy Shedd, Scott Schuetter, Gregory Nellis, Chris Van Peski

Proc. SPIE. 6154, Optical Microlithography XIX

KEYWORDS: Semiconductors, Refractive index, Data modeling, Capillaries, Interfaces, Solids, Immersion lithography, Semiconducting wafers, Fluid dynamics, Liquids

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SPIE Journal Paper | 1 January 2006

Modeling and experimental investigation of bubble entrapment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Chris Van Peski, Andrew Grenville

JM3 Vol. 5 Issue 01

KEYWORDS: Semiconducting wafers, Immersion lithography, Liquids, Quartz, Image processing, Microfluidics, Cameras, Glasses, Fluid dynamics, Calcium

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SPIE Journal Paper | 1 July 2005

General model for estimating bubble dissolution and droplet evaporation times

Timothy Shedd

JM3 Vol. 4 Issue 03

KEYWORDS: Liquids, Nitrogen, Diffusion, Immersion lithography, Interfaces, Solids, Spherical lenses, Semiconducting wafers, Protactinium, Molecules

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Proceedings Article | 6 December 2004 Paper

Modeling and experimental investigation of bubble entrainment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Benjamin Spike, Chris Van Peski, Andrew Grenville, Roxann Engelstad

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Refractive index, Imaging systems, Cameras, Water, Image processing, Nitrogen, Immersion lithography, Semiconducting wafers, Fluid dynamics, Liquids

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Proceedings Article | 28 May 2004 Paper

Scattering in liquid immersion lithography

Michael Switkes, Theodore Bloomstein, Roderick Kunz, Mordechai Rothschild, J. Ruberti, T. Shedd, Michael Yeung

Proc. SPIE. 5377, Optical Microlithography XVII

KEYWORDS: Lithography, Scattering, Water, Interfaces, Rayleigh scattering, Raman scattering, Immersion lithography, Semiconducting wafers, Scatter measurement, Liquids

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Showing 5 of 12 publications

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