Dr. Ting-Hang Pei Profile

Dr. Ting-Hang Pei

at National Yang Ming Chiao Tung Univ.

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 13 December 2020 Poster + Paper

The calibration source assembly for SPICA/SAFARI instrument

Shiang-Yu Wang, MingJye Wang, Tse-Jun Chen, Yen-Pin Chang, Yen-Ru Huang, Chun-Lun Wang, Chuang-Ping Chiu, Ting-Hang Pei, Jaap Evers, David Arrazola, Martin Eggens, Sylvain Martin, Willem Jellema

Proceedings Volume 11443, 114436H (2020) https://doi.org/10.1117/12.2561197

KEYWORDS: Calibration, Assembly equipment, Integrating spheres, Spectroscopy, Sensors, Far infrared, Infrared spectroscopy, Space telescopes, Aerospace engineering, Infrared telescopes

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Proceedings Article | 23 August 2013 Paper

A continuous-wave THz imaging system

Ting-Hang Pei, Yang-Tung Huang, Yu-Jiu Wang, Wei-Zen Chen, Chien-Nan Kuo, Yu-Ting Cheng

Proceedings Volume 8909, 89091G (2013) https://doi.org/10.1117/12.2035020

KEYWORDS: Terahertz radiation, Sensors, Imaging systems, Continuous wave operation, Lenses, Antennas, Beam splitters, Teeth, Mirrors, Millimeter wave imaging

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SPIE Journal Paper | 1 October 2010

Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method

Yen-Min Lee, Jia-Han Li, Philip Ng, Ting-Hang Pei, Fu-Min Wang, Kuen-Yu Tsai, Alek Chen

JM3, Vol. 9, Issue 04, 043003, (October 2010) https://doi.org/10.1117/12.10.1117/1.3503532

KEYWORDS: Extreme ultraviolet, Finite-difference time-domain method, Reflectivity, Refractive index, Scattering, Computer simulations, Silicon, Photomasks, Molybdenum, Surface roughness

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Proceedings Article | 3 April 2010 Paper

Architecture for next-generation massively parallel maskless lithography system (MPML2)

Ming-Shing Su, Kuen-Yu Tsai, Yi-Chang Lu, Yu-Hsuan Kuo, Ting-Hang Pei, Jia-Yush Yen

Proceedings Volume 7637, 76371Q (2010) https://doi.org/10.1117/12.846444

KEYWORDS: Semiconducting wafers, Maskless lithography, Lithography, Photomasks, Data processing, Manufacturing, Electron beams, Data centers, Lenses, Microelectromechanical systems

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Proceedings Article | 23 March 2010 Paper

Stochastic simulation of photon scattering for EUV mask defect inspection

Ting-Hang Pei, Kuen-Yu Tsai, Jia-Han Li

Proceedings Volume 7636, 763624 (2010) https://doi.org/10.1117/12.846695

KEYWORDS: Scattering, Extreme ultraviolet, Photomasks, Silicon, Light scattering, Defect inspection, Reflectivity, Inspection, Stochastic processes, Signal detection

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Proceedings Article | 14 December 2009 Paper

Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography

Sheng-Yung Chen, Kuen-Yu Tsai, Hoi-Tou Ng, Chi-Hsiang Fan, Ting-Hang Pei, Chieh-Hsiung Kuan, Yung-Yaw Chen, Jia-Yush Yen

Proceedings Volume 7520, 75202K (2009) https://doi.org/10.1117/12.837048

KEYWORDS: Sensors, Monte Carlo methods, Electron beams, Signal detection, Lithography, Electron beam lithography, Detector arrays, Optical simulations, Semiconducting wafers, Silicon

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Proceedings Article | 12 December 2009 Paper

Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method

Yen-Min Lee, Jia-Han Li, Philip Ng, Ting-Han Pei, Fu-Min Wang, Kuen-Yu Tsai, Alek Chen

Proceedings Volume 7520, 75200W (2009) https://doi.org/10.1117/12.837150

KEYWORDS: Finite-difference time-domain method, Extreme ultraviolet, Computer simulations, Reflectivity, Refractive index, Error analysis, Scattering, Molybdenum, Silicon, Surface roughness

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Proceedings Article | 11 December 2009 Paper

A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows

Philip C. W. Ng, Kuen-Yu Tsai, Yen-Min Lee, Ting-Han Pei, Fu-Min Wang, Jia-Han Li, Alek Chen

Proceedings Volume 7520, 75200S (2009) https://doi.org/10.1117/12.837077

KEYWORDS: Photomasks, Model-based design, 3D modeling, Optical proximity correction, Semiconducting wafers, Computer simulations, Extreme ultraviolet, Process modeling, Extreme ultraviolet lithography, Image segmentation

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Showing 5 of 8 publications

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