Mr. Todd Embree Profile

Todd Embree

Senior Technologist at Sandia National Labs

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 1 September 2015 Paper

A polarization system for persistent chemical detection

Julia Craven-Jones, Leah Appelhans, Todd Embree, Patrick Finnegan, Dennis Goldstein, Charles LaCasse, Ting Luk, Adoum Mahamat, Lee Massey, Anthony Tanbakuchi, Cody Washburn, Steven Vigil, Eric Couphos, David Karelitz

Proceedings Volume 9613, 96130B (2015) https://doi.org/10.1117/12.2188718

KEYWORDS: Polarization, Polarimetry, Signal to noise ratio, Prototyping, Sensors, Chemical analysis, Humidity, Chemical detection, Coating, Titanium dioxide

Read Abstract +

Proceedings Article | 15 October 2012 Paper

Optical design and performance testing of an athermal SWIR gas correlation imager

J. Mercier, A. Tanbakuchi, A. Ison, T. Embree, M. Smith, S. Vigil

Proceedings Volume 8491, 84910B (2012) https://doi.org/10.1117/12.928001

KEYWORDS: Tolerancing, Sensors, Optical design, Silicon, Objectives, Imaging systems, Modulation transfer functions, Short wave infrared radiation, Optical alignment, Beam splitters

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Optical damage testing of materials for use in 157-nm photolithographic systems

Richard Morton, Chris Van Peski, Zsolt Bor, Todd Embree

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435648

KEYWORDS: Birefringence, Absorption, Calcium, Optical damage, Nitrogen, Wavefront distortions, Optical testing, Adaptive optics, Deep ultraviolet, Beam delivery

Read Abstract +

Proceedings Article | 12 April 2001 Paper

Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

Todd Embree, Chris Van Peski, Zsolt Bor, Richard Morton

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425033

KEYWORDS: Birefringence, Adaptive optics, Wavefront distortions, Silica, Absorption, Excimer lasers, Distortion, FT-IR spectroscopy, Manufacturing, Semiconductors

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Alexander Ershov, Gunasiri Padmabandu, Richard Ness, Paul Melcher, Herve Besaucele, Palash Das, Thomas Duffey, Steven Grove, Todd Embree, Vladimir Fleurov

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388986

KEYWORDS: Optical lithography, Sensors, 193nm lithography, Pulsed power, Laser stabilization, Control systems, Laser applications, Optics manufacturing, Fabry–Perot interferometers, Optical components

Read Abstract +

Proceedings Article | 29 June 1998 Paper

ArF lasers for production of semiconductor devices with CD<0.15 um

Toshihiko Ishihara, Todd Embree, Tom Watson, Thomas Duffey, Richard Morton, Richard Sandstrom, William Partlo

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310731

KEYWORDS: Lithography, Laser applications, Pulsed laser operation, Semiconductors, Excimer lasers, Laser stabilization, Optical damage, Semiconductor lasers, Diffraction gratings, Pulsed power

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years