Mr. Todd Embree Profile

Todd Embree

Senior Technologist at Sandia National Labs

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Publications (6)

Proceedings Article | 1 September 2015 Paper

A polarization system for persistent chemical detection

Julia Craven-Jones, Leah Appelhans, Eric Couphos, Todd Embree, Patrick Finnegan, Dennis Goldstein, David Karelitz, Charles LaCasse, Ting Luk, Adoum Mahamat, Lee Massey, Anthony Tanbakuchi, Cody Washburn, Steven Vigil

Proc. SPIE. 9613, Polarization Science and Remote Sensing VII

KEYWORDS: Signal to noise ratio, Titanium dioxide, Polarization, Sensors, Coating, Polarimetry, Humidity, Chemical detection, Chemical analysis, Prototyping

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Proceedings Article | 15 October 2012 Paper

Optical design and performance testing of an athermal SWIR gas correlation imager

A. Tanbakuchi, M. Smith, J. Mercier, S. Vigil, T. Embree, A. Ison

Proc. SPIE. 8491, Optical System Alignment, Tolerancing, and Verification VI

KEYWORDS: Short wave infrared radiation, Optical design, Beam splitters, Imaging systems, Sensors, Silicon, Objectives, Optical alignment, Modulation transfer functions, Tolerancing

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Proceedings Article | 14 September 2001 Paper

Optical damage testing of materials for use in 157-nm photolithographic systems

Richard Morton, Todd Embree, Zsolt Bor, Chris Van Peski

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Deep ultraviolet, Birefringence, Calcium, Nitrogen, Beam delivery, Adaptive optics, Optical testing, Wavefront distortions, Optical damage, Absorption

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Proceedings Article | 12 April 2001 Paper

Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

Chris Van Peski, Zsolt Bor, Todd Embree, Richard Morton

Proc. SPIE. 4347, Laser-Induced Damage in Optical Materials: 2000

KEYWORDS: Semiconductors, FT-IR spectroscopy, Silica, Birefringence, Manufacturing, Adaptive optics, Distortion, Excimer lasers, Wavefront distortions, Absorption

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Proceedings Article | 5 July 2000 Paper

Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Herve Besaucele, Palash Das, Thomas Duffey, Todd Embree, Alexander Ershov, Vladimir Fleurov, Steven Grove, Paul Melcher, Richard Ness, Gunasiri Padmabandu

Proc. SPIE. 4000, Optical Microlithography XIII

KEYWORDS: Optical components, Fabry–Perot interferometers, Optical lithography, Sensors, Laser applications, Control systems, Laser stabilization, Optics manufacturing, Pulsed power, 193nm lithography

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Showing 5 of 6 publications

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