Todd Lukanc
Manager OPC Group at Intel Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Data modeling, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Vestigial sideband modulation

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Chromium, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Aberration correction, Manufacturing, Scanning electron microscopy, Printing, Bridges, Optical proximity correction, Algorithm development, Semiconducting wafers, Illumination engineering, Resolution enhancement technologies

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Image processing, Error analysis, Manufacturing, Electroluminescence, Photomasks, Optical proximity correction, SRAF

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Photomasks, Transistors, Cadmium sulfide, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Showing 5 of 6 publications
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