Mr. Tokihisa Kaneguchi Profile

Tokihisa Kaneguchi

at Sony Semiconductor Solutions

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Publications (3)

Proceedings Article | 20 October 2006 Paper

A new criterion of mask birefringence for polarized illumination

Kazuya Iwase, Boontarika Thunnakart, Tokihisa Kaneguchi, Ken Ozawa, Toshifumi Yokoyama, Yasutaka Morikawa, Fumikatsu Uesawa

Proceedings Volume 6349, 634951 (2006) https://doi.org/10.1117/12.685360

KEYWORDS: Birefringence, Photomasks, Polarization, Cadmium sulfide, Tolerancing, Electroluminescence, Lithography, Critical dimension metrology, Lawrencium, Wave plates

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Proceedings Article | 15 March 2006 Paper

Effect of azimuthally polarized illumination imaging on device patterns beyond 45nm node

Ken Ozawa, Boontarika Thunnakart, Tokihisa Kaneguchi, Isao Mita, Atsushi Someya, Toshiharu Nakashima, Hisashi Nishinaga, Yasushi Mizuno, Tomoyuki Matsuyama, Masato Hamatani

Proceedings Volume 6154, 61540C (2006) https://doi.org/10.1117/12.656242

KEYWORDS: Lithographic illumination, Lithography, Line edge roughness, SRAF, Polarization, Photomasks, Imaging devices, Optical proximity correction, Manufacturing, Logic

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Proceedings Article | 12 May 2005 Paper

Robust lithography process control methodology anticipating CD after etching using scatterometry below 65nm node

Tokihisa Kaneguchi, Atsushi Someya, Hiroichi Kawahira

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598574

KEYWORDS: Critical dimension metrology, Etching, Lithography, Scatterometry, Photomasks, Photoresist processing, Process control, Optical proximity correction, Semiconductors, Chemical elements

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