CONFERENCE PROCEEDINGS
Advanced Search
Tomas Chin
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 17 October 2008 Paper
70nm DRAM intra-field CDU improvement by dose modulation on mask transmittance
Wen Bin Wu, Tomas Chin, Guy Ben Zvi, Chiang Lin Shih, Pei Cheng Fan
Proceedings Volume 7122, 712238 (2008) https://doi.org/10.1117/12.801417
KEYWORDS: Photomasks, Critical dimension metrology, Transmittance, Modulation, Calibration, Semiconducting wafers, Reticles, Signal attenuation, Scanners, Quartz
Proceedings Article | 17 October 2008 Paper
High accuracy jog CD control on OPC pattern by advanced laser writer Sigma7500
Tomas Chin, Wen-Bin Wu, Chiang-Lin Shih
Proceedings Volume 7122, 712237 (2008) https://doi.org/10.1117/12.801414
KEYWORDS: Critical dimension metrology, Optical proximity correction, Photomasks, Electron beams, Spatial light modulators, Vestigial sideband modulation, Laser applications, Deep ultraviolet, Modulation, Beam shaping
Proceedings Article | 30 October 2007 Paper
Evaluation of the effect of mask-blank flatness on CDU and DOF in high-NA systems
Tomas Chin, Derek Chen, Gordon Chan, Chia Wen Chang, Torey Huang, Christopher Lee, Richard Lu, Steven Fan
Proceedings Volume 6730, 67300D (2007) https://doi.org/10.1117/12.746614
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Finite element methods, Critical dimension metrology, Error analysis, Lutetium, Fluctuations and noise, Printing, Pellicles
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top