Mr. Tomohiko Tsutsumi Profile

Tomohiko Tsutsumi

Expert at Tokyo Electron Ltd

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Publications (2)

Proceedings Article | 19 March 2015 Paper

Toward high-performance quality meeting IC device manufacturing requirements with AZ SMART DSA process

JiHoon Kim, Jian Yin, Yi Cao, YoungJun Her, Claire Petermann, Hengpeng Wu, Jianhui Shan, Tomohiko Tsutsumi, Guanyang Lin

Proceedings Volume 9423, 94230R (2015) https://doi.org/10.1117/12.2086160

KEYWORDS: Picosecond phenomena, Line edge roughness, Semiconducting wafers, Line width roughness, Critical dimension metrology, Optical lithography, Polymethylmethacrylate, Etching, Plasma etching, Directed self assembly

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Proceedings Article | 2 April 2014 Paper

Advanced CD-SEM metrology for pattern roughness and local placement of lamellar DSA

Takeshi Kato, Akiyuki Sugiyama, Kazuhiro Ueda, Hiroshi Yoshida, Shinji Miyazaki, Tomohiko Tsutsumi, JiHoon Kim, Yi Cao, Guanyang Lin

Proceedings Volume 9050, 90501T (2014) https://doi.org/10.1117/12.2060924

KEYWORDS: Semiconducting wafers, Line edge roughness, Line width roughness, Edge roughness, Etching, Critical dimension metrology, Finite element methods, Process control, Chemical analysis, Directed self assembly

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