Tomohiro Iijima
at Nuflare Technology Inc
SPIE Involvement:
Publications (6)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Electron beams, Photomasks, Beam shaping, Critical dimension metrology

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Seaborgium, Amplifiers, LCDs, Photomasks, Beam shaping, Electron beam melting, Mask making, Data conversion

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beams, Logic, Amplifiers, LCDs, Objectives, Photomasks, Electron beam melting, Mask making, Vestigial sideband modulation

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Amplifiers, Data processing, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Mask making, Data conversion, Data corrections, Data storage servers

SPIE Journal Paper | 1 October 2008
JM3 Vol. 7 Issue 04
KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

Showing 5 of 6 publications
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