CONFERENCE PROCEEDINGS
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Tomonori Dosho
at Nikon Corp
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 20 March 2018 Paper
Enhancement of ArF immersion scanner system for advanced device node manufacturing
Yujiro Hikida, Akira Hayakawa, Yoshihiro Teshima, Tomonori Dosho, Noriaki Kasai, Yasushi Yoda, Kazuo Masaki, Yuichi Shibazaki
Proceedings Volume 10587, 105870X (2018) https://doi.org/10.1117/12.2297302
KEYWORDS: Semiconducting wafers, Scanners, Optical alignment, Overlay metrology, Control systems, Manufacturing, Lithography, Process control
Proceedings Article | 13 March 2018 Paper
Feed-forward alignment correction for advanced overlay process control using a standalone alignment station "Litho Booster"
Takehisa Yahiro, Junpei Sawamura, Tomonori Dosho, Yuji Shiba, Satoshi Ando, Jun Ishikawa, Masahiro Morita, Yuichi Shibazaki
Proceedings Volume 10585, 105852Z (2018) https://doi.org/10.1117/12.2297300
KEYWORDS: Semiconducting wafers, Optical alignment, Optical parametric oscillators, Process control, Overlay metrology, Metrology, Scanners, Distortion, Lithography, Manufacturing
Proceedings Article | 24 March 2017 Paper
On-product overlay improvement with an enhanced alignment system
Proceedings Volume 10147, 1014716 (2017) https://doi.org/10.1117/12.2257659
KEYWORDS: Semiconducting wafers, Optical alignment, Lithography, Manufacturing, Chemical mechanical planarization, Precision measurement, Overlay metrology, Distortion, Optical parametric oscillators, Systems modeling, 3D modeling
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