Mr. Tomotaka Higaki Profile

Tomotaka Higaki

at Kioxia Holdings Corp

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Author

Publications (6)

Proceedings Article | 25 September 2010 Paper

High performance photomask technology with the advanced binary film

Koji Murano, Kosuke Takai, Kunihiro Ugajin, Machiko Suenaga, Takeharu Motokawa, Masato Saito, Tomotaka Higaki, Osamu Ikenaga, Hidehiro Watanabe

Proceedings Volume 7823, 78232W (2010) https://doi.org/10.1117/12.866015

KEYWORDS: Photomasks, Critical dimension metrology, Etching, Chromium, Lithography, Binary data, Photomask technology, Thin films, Photoresist processing, Inspection

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Proceedings Article | 19 May 2008 Paper

Impact of patterning strategy on mask fabrication beyond 32nm

Shoji Mimotogi, Tomotaka Higaki, Hideki Kanai, Satoshi Tanaka, Masaki Satake, Yosuke Kitamura, Katsuyoshi Kodera, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kazuhiro Takahata, Soichi Inoue

Proceedings Volume 7028, 702814 (2008) https://doi.org/10.1117/12.793045

KEYWORDS: Optical lithography, Photomasks, Double patterning technology, Critical dimension metrology, Lithography, Mask making, Logic devices, Optical alignment, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 19 May 2008 Paper

Application of two-fluid nozzles for advanced photomask cleaning process

Kenji Masui, Tetsuo Takemoto, Kyo Otsubo, Mari Sakai, Tomotaka Higaki, Hidehiro Watanabe, Tsutomu Kikuchi, Yoshiaki Kurokawa

Proceedings Volume 7028, 702809 (2008) https://doi.org/10.1117/12.793018

KEYWORDS: Particles, Photomasks, Mask cleaning, Liquids, Mechatronics, Velocity measurements, Phase measurement, Cavitation, Quartz

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Proceedings Article | 11 May 2007 Paper

1-nm of local CD accuracy for 45-nm-node photomask with low sensitivity CAR for e-beam writer

Kunihiro Ugajin, Masato Saito, Machiko Suenaga, Tomotaka Higaki, Hideaki Nishino, Hidehiro Watanabe, Osamu Ikenaga

Proceedings Volume 6607, 66070A (2007) https://doi.org/10.1117/12.728923

KEYWORDS: Line edge roughness, Photomasks, Electron beams, Reticles, Chemical analysis, Diffusion, Electronics, Scanning electron microscopy, Process engineering, Chemically amplified resists

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Proceedings Article | 20 May 2006 Paper

Higher current density operation with EB reticle writer EBM-5000

Masato Saito, Kunihiro Ugajin, Tomotaka Higaki, Hideaki Nishino, Hidehiro Watanabe

Proceedings Volume 6283, 62831L (2006) https://doi.org/10.1117/12.681747

KEYWORDS: Reticles, Statistical analysis, Optical simulations, Photomasks, Photoresist processing, Computer simulations, Process engineering, Electron beams, Standards development, Darmstadtium

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Proceedings Article | 28 August 2003 Paper

Photomask repeater strategy for high-quality and low-cost reticle fabrication

Suigen Kyoh, Soichi Inoue, Osamu Ikenaga, Tomotaka Higaki, Fumiaki Shigemitsu, Ichiro Mori, Haruo Kokubo, Naoya Hayashi, Nobuyuki Irie, Yuki Ishii, Toshikazu Umatate

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504178

KEYWORDS: Photomasks, Reticles, Mask making, Deep ultraviolet, Optical lithography, Semiconductors, Printing, Manufacturing, Lithography, Critical dimension metrology

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Showing 5 of 6 publications

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