CONFERENCE PROCEEDINGS
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Tomoyuki Takeishi
at Toshiba Corp
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Author
Publications (5)
Proceedings Article | 29 March 2006 Paper
Pattern defect study using cover material film in immersion lithography
Proceedings Volume 6153, 61531Q (2006) https://doi.org/10.1117/12.655505
KEYWORDS: Semiconducting wafers, Coating, Immersion lithography, Particles, Inspection, Silicon, Wafer inspection, Wafer testing, Water, Digital watermarking
Proceedings Article | 4 May 2005 Paper
Influence of the watermark in immersion lithography process
Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, Kentarou Matsunaga, Naofumi Shibata, Kaoru Ozawa, Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, Seiki Ishida, Takayuki Toshima, Yasunobu Oonishi, Shinichi Ito
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599314
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Digital watermarking, Immersion lithography, Silicon, Photoresist processing, Thin film coatings, Coating, Liquids, Water
Proceedings Article | 4 May 2005 Paper
A novel post exposure bake technique to improve CD uniformity over product wafers
Tomoyuki Takeishi, K. Hayasaki, Tsuyoshi Shibata
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599192
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Lithography, Silicon, Photomasks, Process control, Photoresist processing, Process engineering, Manufacturing, Control systems
Proceedings Article | 12 June 2003 Paper
Novel laser ablation patterning with organic thin film in running water
Shinichi Ito, Hiroshi Ikegami, Kenji Kawano, Tomoyuki Takeishi, Nobuo Hayasaka, Masayoshi Kobayashi, Tetsuya Hamamoto, Yoichi Ogawa, Naoto Yoshitaka, Shoichi Terada
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485045
KEYWORDS: Laser ablation, Particles, Photoresist processing, Optical lithography, Optical alignment, Video, Cameras, Thin films, Lithography, Natural surfaces
Proceedings Article | 12 June 2003 Paper
Novel development technique using ozonated water
Kei Hayasaki, Riichiro Takahashi, Tomoyuki Takeishi, Shinichi Ito
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485068
KEYWORDS: Semiconducting wafers, Photoresist processing, Critical dimension metrology, Particles, Natural surfaces, Scanning electron microscopy, Defect inspection, Inspection, Optical testing, Process engineering
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