Dr. Tong Liu Profile

Dr. Tong Liu

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Proceedings Article | 17 October 2008 Paper

Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles

Roman Gouk, James Papanu, Fred Li, Jason Jeon, Tong Liu, Rao Yalamanchili

Proceedings Volume 7122, 712211 (2008) https://doi.org/10.1117/12.801549

KEYWORDS: Particles, Cavitation, SRAF, Nondestructive evaluation, Spherical lenses, Photomasks, Mask cleaning, Chemistry, Acoustics, Liquids

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Particle removal without damage has been demonstrated for <60nm photomask sub-resolution assist features with droplet momentum cleaning technology that employs NanoDroplet^TM mixed-fluid jet nozzle. Although 99%+ particle removal efficiency can be achieved for standard Si₃N₄ particles with broad size distribution, there are some cleaning challenges with small (<100nm) and large contact area (>500nm) particles. It was found that tunable uniform cavitation can provide the additional physical assist force needed to improve cleaning efficiency of these challenging particles while meeting the damage-fee cleaning requirement. An integrated cleaning process was developed that combines both droplet momentum and damage-free cavitation technology. Cleaning tests were performed with different types of challenging particles. The results showed 5-8% particle removal efficiency improvement as compared to momentum based only cleaning. All masks were processed using the Tetra^TM mask cleaning tool configured with NanoDroplet^TM mixed fluid jet technology and full face megasonics.

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