Mr. Torsten Harzendorf Profile

Torsten Harzendorf

Research and process engineer at Fraunhofer Institute - IOF

SPIE Involvement:

Author

Area of Expertise:

Photo and electron beam lithography , SEM FIB AFM characterization , Microoptical technologies

Websites:

Company Website

Publications (14)

Proceedings Article | 13 December 2020 Presentation + Paper

Échelle grating with improved polarization characteristics used for Earth observation

Susann Sadlowski, Torsten Harzendorf, Stefan Schwinde, Frank Burmeister, Dirk Michaelis, Thomas Flügel-Paul, Uwe Zeitner

Proceedings Volume 11451, 114511D (2020) https://doi.org/10.1117/12.2562546

KEYWORDS: Polarization, Diffraction gratings, Optics manufacturing, Optical design, Crystals, Diffraction, Silicon, Earth's atmosphere, Spectroscopic atmospheric monitoring techniques, Spectral resolution

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Proceedings Article | 19 February 2020 Paper

Design and fabrication of a lightweight AR headset demonstrator using a buried Fresnel mirror combiner

Dirk Michaelis, Axel Bodemann, Peter Schreiber, Torsten Harzendorf, Stephanie Fischer, Ralf Rosenberger

Proceedings Volume 11310, 113100M (2020) https://doi.org/10.1117/12.2543051

KEYWORDS: Mirrors, RGB color model, Image analysis, Refraction

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Proceedings Article | 6 September 2018 Presentation + Paper

Surface relief gratings manufactured by lithographic means being a candidate for VLT MOONS instrument’s main dispersers

Torsten Harzendorf, Dirk Michaelis, Thomas Flügel-Paul, Andrea Bianco, Ernesto Oliva, Uwe Zeitner

Proceedings Volume 10706, 1070621 (2018) https://doi.org/10.1117/12.2313164

KEYWORDS: Diffraction gratings, Lithography, Diffraction, Electron beam lithography, Chromium, Binary data, Optical design, Polarization, Etching, Tolerancing

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Proceedings Article | 22 July 2016 Paper

New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers

T. Flügel-Paul, G. Kalkowski, T. Benkenstein, T. Harzendorf, A. Matthes, U. Zeitner

Proceedings Volume 9912, 99122A (2016) https://doi.org/10.1117/12.2232538

KEYWORDS: Diffraction gratings, Diffraction, Polarization, Coating, Silica, Spectrometers, Atomic layer deposition, Near infrared, Manufacturing, Refractive index

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Proceedings Article | 2 May 2014 Paper

Fast character projection electron beam lithography for diffractive optical elements

Torsten Harzendorf, Frank Fuchs, Michael Banasch, Uwe Zeitner

Proceedings Volume 9130, 91300Y (2014) https://doi.org/10.1117/12.2052229

KEYWORDS: Nanostructures, Electron beam lithography, Antireflective coatings, Diffraction gratings, Electron beams, Nanolithography, Etching, Silica, Chromium, Reactive ion etching

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Proceedings Article | 7 March 2014 Paper

Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection

Uwe Zeitner, Torsten Harzendorf, Frank Fuchs, Michael Banasch, Holger Schmidt, Ernst-Bernhard Kley

Proceedings Volume 8974, 89740G (2014) https://doi.org/10.1117/12.2040206

KEYWORDS: Vestigial sideband modulation, Electron beam lithography, Lithography, Plasmonics, Nanolithography, Electron beams, Beam shaping, Metamaterials, Fabrication, Gaussian beams

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Proceedings Article | 7 March 2014 Paper

Application of rigorously optimized phase masks for the fabrication of binary and blazed gratings with diffractive proximity lithography

Lorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, Stefan Meyer, Uwe Zeitner

Proceedings Volume 8974, 897415 (2014) https://doi.org/10.1117/12.2037245

KEYWORDS: Photomasks, Binary data, Diffraction gratings, Lithography, Electron beam lithography, Diffraction, Optical lithography, Semiconducting wafers, Image processing, Image resolution

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Proceedings Article | 9 May 2012 Paper

Novel gap alignment sensor for high-resolution proximity lithography

Torsten Harzendorf, Lorenz Stuerzebecher, Uwe Zeitner

Proceedings Volume 8428, 842815 (2012) https://doi.org/10.1117/12.922425

KEYWORDS: Photomasks, Sensors, Semiconducting wafers, Lithography, Active sensors, Microscopes, Distance measurement, Optical alignment, Image sensors, Inspection

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Proceedings Article | 15 February 2012 Paper

Submicrometer pattern generation by diffractive mask-aligner lithography

Uwe Zeitner, Lorenz Stuerzebecher, Torsten Harzendorf, Frank Fuchs, Dirk Michaelis

Proceedings Volume 8249, 82490Q (2012) https://doi.org/10.1117/12.909806

KEYWORDS: Photomasks, Lithography, Diffraction, Lithographic illumination, Printing, Micro optics, Collimation, Semiconducting wafers, Fabrication, Electron beam lithography

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Proceedings Article | 15 February 2012 Paper

Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography

Lorenz Stuerzebecher, Torsten Harzendorf, Frank Fuchs, Uwe Zeitner

Proceedings Volume 8249, 82490R (2012) https://doi.org/10.1117/12.908737

KEYWORDS: Photomasks, Diffraction, Semiconducting wafers, Lithography, Electron beam lithography, Diffraction gratings, Image processing, Reactive ion etching, Scanning electron microscopy, Submicron lithography

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Proceedings Article | 13 September 2011 Paper

Effects of metallic nanoparticle arrays in Si solar cell structures

Tino Benkenstein, Michael Flämmich, Torsten Harzendorf, Thomas Käsebier, Dirk Michaelis, Maria Oliva, Christoph Wächter, Uwe Zeitner

Proceedings Volume 8110, 81100D (2011) https://doi.org/10.1117/12.894385

KEYWORDS: Absorption, Particles, Silicon, Nanoparticles, Solar cells, Scattering, Silver, Plasmonics, Atomic force microscopy, Interfaces

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Proceedings Article | 14 May 2010 Paper

Smart technology for blazed multilevel gratings in resonance domain

M. Oliva, T. Benkenstein, J. Dunkel, T. Harzendorf, A. Matthes, D. Michaelis, U. Zeitner

Proceedings Volume 7716, 77161L (2010) https://doi.org/10.1117/12.854587

KEYWORDS: Diffraction gratings, Diffraction, Standards development, Chromium, Photomasks, Optical alignment, Optical design, Lithography, Etching, Electron beam lithography

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Proceedings Article | 13 May 2010 Paper

Half-tone proximity lithography

Torsten Harzendorf, Lorenz Stuerzebecher, Uwe Vogler, Uwe Zeitner, Reinhard Voelkel

Proceedings Volume 7716, 77160Y (2010) https://doi.org/10.1117/12.854307

KEYWORDS: Photomasks, Diffraction, Lithography, Lithographic illumination, Micro optics, Point spread functions, Binary data, Molybdenum, Modulation, Chromium

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Proceedings Article | 18 August 2000 Paper

Fabrication of microlens arrays in CaF2 by ion milling

Dieter Flamm, Axel Schindler, Torsten Harzendorf, Ernst-Bernhard Kley

Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395680

KEYWORDS: Ions, Etching, Photoresist materials, Calcium, Microlens, Surface roughness, Sputter deposition, Lenses, Ion beams, Microlens array

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Showing 5 of 14 publications

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