Torsten Harzendorf
Research and process engineer at Fraunhofer Institute - IOF
SPIE Involvement:
Author
Area of Expertise:
Photo and electron beam lithography , SEM FIB AFM characterization , Microoptical technologies
Websites:
Publications (13)

Proceedings Article | 19 February 2020 Paper
Proc. SPIE. 11310, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR)
KEYWORDS: Mirrors, Image analysis, Refraction, RGB color model

Proceedings Article | 6 September 2018 Presentation + Paper
Proc. SPIE. 10706, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III
KEYWORDS: Lithography, Electron beam lithography, Diffraction, Optical design, Polarization, Etching, Chromium, Tolerancing, Binary data, Diffraction gratings

Proceedings Article | 22 July 2016 Paper
Proc. SPIE. 9912, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation II
KEYWORDS: Near infrared, Diffraction, Refractive index, Silica, Polarization, Spectrometers, Coating, Manufacturing, Atomic layer deposition, Diffraction gratings

Proceedings Article | 2 May 2014 Paper
Proc. SPIE. 9130, Micro-Optics 2014
KEYWORDS: Nanostructures, Electron beam lithography, Antireflective coatings, Electron beams, Silica, Etching, Chromium, Reactive ion etching, Nanolithography, Diffraction gratings

Proceedings Article | 7 March 2014 Paper
Proc. SPIE. 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
KEYWORDS: Fabrication, Metamaterials, Lithography, Plasmonics, Electron beam lithography, Electron beams, Gaussian beams, Beam shaping, Nanolithography, Vestigial sideband modulation

Showing 5 of 13 publications
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