Toru Shirasaki
at Shin-Etsu Chemical Co., Ltd.
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Optical lithography, Switching, Polymers, Manufacturing, Distortion, Cobalt, Pellicles, Photomasks, Aluminum, Adhesives

Proceedings Article | 19 July 2000 Paper
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Lithography, Contamination, Silica, Polymers, Laser applications, Pellicles, Photomasks, Excimer lasers, Tolerancing, Absorption

Proceedings Article | 25 August 1999 Paper
Proc. SPIE. 3748, Photomask and X-Ray Mask Technology VI
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Etching, Laser development, Surface roughness, Laser irradiation, Pellicles, Excimer lasers, Semiconducting wafers

Proceedings Article | 24 July 1996 Paper
Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III
KEYWORDS: Oxides, Optical lithography, Quartz, Resistance, Bioalcohols, Oxygen, Pellicles, Transmittance, Excimer lasers, Oxidation

Proceedings Article | 3 November 1994 Paper
Proc. SPIE. 2254, Photomask and X-Ray Mask Technology
KEYWORDS: Optical lithography, Particles, Silicon, Resistance, Pellicles, Photomasks, Excimer lasers, Excimers, Adhesives, X-ray technology

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