Mr. Toshiaki Motonaga Profile

Toshiaki Motonaga

Marketing Manager at DNP Europa GmbH

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Author

Publications (5)

Proceedings Article | 6 December 2004 Paper

Evaluation of dry etching and defect repair of EUVL mask absorber layer

Tsukasa Abe, Masaharu Nishiguchi, Tsuyoshi Amano, Toshiaki Motonaga, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Yuusuke Tanaka, Iwao Nishiyama

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569397

KEYWORDS: Etching, Chromium, Plasma, Dry etching, Photoresist processing, Atomic force microscopy, Extreme ultraviolet lithography, Photomasks, Image processing, Diamond machining

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Proceedings Article | 20 August 2004 Paper

Study of mask process development for EUVL

Tsukasa Abe, Masaharu Nishiguchi, Tsuyoshi Amano, Toshiaki Motonaga, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Yuusuke Tanaka, Hiromasa Yamanashi, Iwao Nishiyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557817

KEYWORDS: Etching, Atomic force microscopy, Chromium, Dry etching, Photoresist processing, Extreme ultraviolet lithography, Plasma, Scanning electron microscopy, Photomasks, Diamond machining

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Proceedings Article | 27 December 2002 Paper

Feasibility study of detectability and printability for TaSiOx

Masaharu Nishiguchi, Yasutaka Morikawa, Toshiaki Motonaga, Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468201

KEYWORDS: Inspection, Photomasks, Lithography, Photomask technology, Phase shifting, Quartz, Dry etching, Etching, Defect detection

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Proceedings Article | 5 September 2001 Paper

Development of bilayered TaSiOx-HTPSM: I

Toshiaki Motonaga, M. Ohtsuki, Y. Kinase, H. Nakagawa, Toshifumi Yokoyama, Hiroshi Mohri, Junji Fujikawa, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438337

KEYWORDS: Transmittance, Phase shifts, Inspection, Reflectivity, Lithography, Laser irradiation, Quartz, Photomasks, Silicon, Tantalum

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Proceedings Article | 5 September 2001 Paper

Development of bilayered TaSiOx-HTPSM: II

Toshifumi Yokoyama, S. Yusa, T. Okamura, H. Nakagawa, Toshiaki Motonaga, Hiroshi Mohri, Junji Fujikawa, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438338

KEYWORDS: Etching, Chromium, Inspection, Opacity, Quartz, Plasma etching, Transmittance, Plasma, Tantalum, Critical dimension metrology

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