Dr. Toshihiko Ishihara Profile

Dr. Toshihiko Ishihara

Technology Marketing Consultant at Cymer LLC

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 1 April 2013 Paper

Paper

CO2/Sn LPP EUV sources for device development and HVM

Igor Fomenkov, David Myers, Daniel Brown, Bruno La Fontaine, Nigel Farrar, David Brandt, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

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Proceedings Article | 23 March 2012 Paper

Paper

Laser produced plasma EUV sources for device development and HVM

Alex Ershov, Peter Porshnev, Michael Woolston, Richard Sandstrom, Robert Jacques, Igor Fomenkov, Michael Lercel, Palash Das, Robert Bergstedt, Wayne Dunstan, Toshi Ishihara, Vladimir Fleurov, Yezheng Tao, David Brandt, Rod Simmons, Robert Rafac, Alexander Bykanov, Imtiaz Ahmad, Bruno La Fontaine, Kevin Zhang, Chirag Rajyaguru, Christian Wittak, Shailendra Srivastava, Norbert Böwering, Georgiy Vaschenko, Daniel Brown, Silvia De Dea, Alexander Schafgans, Jonathan Grava, Peter Baumgart, David Myers

Proceedings Volume 8322, 83221I (2012) https://doi.org/10.1117/12.916521

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Mirrors, Coating, Manufacturing, Tin, Semiconducting wafers, Laser scanners

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Proceedings Article | 8 April 2011 Paper

Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Robert Jacques, Robert Bergstedt, Daniel Brown, Norbert Böwering, Alex Ershov, Peter Baumgart, Bruno La Fontaine, Oleh Khodykin, Richard Sandstrom, Rod Simmons, Alexander Bykanov, Palash Das, Wayne Dunstan, Chirag Rajyaguru, Richard Hou, Shailendra Srivastava, Vladimir Fleurov, Silvia De Dea, William Partlo, Kevin Zhang, Imtiaz Ahmad, Georgiy Vaschenko, David Brandt, David Myers, Toshihiko Ishihara

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

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Proceedings Article | 7 April 2011 Paper

Paper

LPP source system development for HVM

Shailendra Srivastava, Vladimir Fleurov, Norbert Böwering, Silvia De Dea, Georgiy Vaschenko, Wayne Dunstan, Imtiaz Ahmad, Alexander Bykanov, Chirag Rajyaguru, Robert Jacques, Palash Das, David Brandt, Christian Wittak, Robert Bergstedt, Toshihiko Ishihara, Rod Simmons, Igor Fomenkov, Alex Ershov, Peter Baumgart, Richard Sandstrom, Michael Lercel, Bruno La Fontaine, Richard Hou, Oleh Khodykin, William Partlo, David Myers, Daniel Golich, Kevin Zhang

Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

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Proceedings Article | 4 March 2010 Paper

Paper

High reliability ArF light source for double patterning immersion lithography

Rui Jiang, Toshi Ishihara, Daniel Brown, Theodore Cacouris, Rostislav Rokitski, Rajeskar Rao, Mary Haviland

Proceedings Volume 7640, 76401Q (2010) https://doi.org/10.1117/12.849065

KEYWORDS: Light sources, Double patterning technology, Reliability, Immersion lithography, Electrodes, Lithography, Scanners, Deep ultraviolet, Optical proximity correction, Excimer lasers

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Proceedings Article | 11 December 2009 Paper

Paper

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

Daniel Brown, Daniel Riggs, Theodore Cacouris, Toshi Ishihara, Rui Jiang, Rajeskar Rao, Mary Haviland, Slava Rokitski

Proceedings Volume 7520, 752013 (2009) https://doi.org/10.1117/12.839803

KEYWORDS: Light sources, Double patterning technology, Control systems, Scanners, Immersion lithography, Lithography, Deep ultraviolet, Polarization, Optical proximity correction, High volume manufacturing

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Proceedings Article | 16 March 2009 Paper

Paper

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Robert Bergstedt, Toshihiko Ishihara, William Partlo, Theodore Cacouris, Hong Ye, Rostislav Rokitski, Robert Rafac, Daniel Brown, Robert Jacques, Fedor Trintchouk, Vladimir Fleurov, Rajasekhar Rao

Proceedings Volume 7274, 72743O (2009) https://doi.org/10.1117/12.816049

KEYWORDS: Double patterning technology, Polarization, Laser stabilization, Light sources, Scanners, High volume manufacturing, Immersion lithography, Lithography, Deep ultraviolet, Modulation

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Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained significant momentum due to several technical factors, and have been eclipsed by an aggressive push to make DP a high-volume manufacturing solution. The challenge is to develop a cost-effective solution using a process that effectively doubles the lithography steps required for critical layers, while achieving a higher degree of overlay performance. As a result, the light source requirements for DP fall into 3 main categories: (a) higher power to enable higher throughput on the scanner, (b) lower operating costs to offset the increased number of process steps, and (c) high stability of optical parameters to support more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was introduced last year to enable DP by leveraging the higher performance and lower operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform currently used for 45nm immersion lithography in production around the world. In February 2009, the XLR 600ix was introduced as a 60/90W switchable product to provide flexibility in the transition to higher power requirements as scanner capabilities are enhanced. The XLR 600ix includes improved optics materials to meet reliability requirements while operating at higher internal fluences. In this paper we will illustrate the performance characteristics during extended testing. Examples of performance include polarization stability, divergence and pointing stability, which enable consistent pupil fill under extreme illumination conditions, as well as overall thermal stability which maintains constant beam performance under large changes in laser operating modes. Furthermore, the unique beam uniformity characteristics that the ring architecture generates result in lower peak energy densities that are comparable to those of a typical 60W excimer laser. In combination with the XLR's long pulse duration, this allows for long life scanner optics while operating at 15mJ.

Proceedings Article | 15 March 2006 Paper

Paper

XLA-300: the fourth-generation ArF MOPA light source for immersion lithography

Fedor Trintchouk, Christian Wittak, Toshihiko Ishihara, Walter Gillespie, Richard Perkins, Robert Bergstedt, Richard Ness

Proceedings Volume 6154, 615423 (2006) https://doi.org/10.1117/12.658723

KEYWORDS: Light sources, Metrology, Spectroscopy, Scanners, Polarization, Immersion lithography, Acoustics, Manufacturing, Control systems, Pulsed laser operation

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Proceedings Article | 12 May 2005 Paper

Paper

XLA-200: the third-generation ArF MOPA light source for immersion lithography

Christian Wittak, Richard Perkins, Walter Gillespie, Robert Bergstedt, Toshihiko Ishihara, Wayne Dunstan, Robert Rafac, Fedor Trintchouk

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600075

KEYWORDS: Gas lasers, Pulsed laser operation, Polarization, Molybdenum, Light sources, Spectroscopy, Immersion lithography, Fluorine, Birefringence, Beam controllers

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Proceedings Article | 12 May 2005 Paper

Paper

6 kHz MOPA light source for 193 nm immersion lithography

George Ferguson, Michael Simon, Walter Gillespie, Toshihiko Ishihara, William Partlo

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601664

KEYWORDS: Acoustics, Fluctuations and noise, Pulsed laser operation, Control systems, Light sources, Head, Immersion lithography, Electrodes, Pulsed power, Laser stabilization

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Proceedings Article | 28 May 2004 Paper

Paper

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Walter Gillespie, Mary Haviland, Cynthia Maley, Robert Poole, Toshihiko Ishihara, Bryan Moosman, Richard Morton, Patrick O'Keeffe, Timothy Dyer, Herve Besaucele, Vladimir Fleurov

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535614

KEYWORDS: Molybdenum, Oscillators, Optical lithography, Calibration, Electrodes, Manufacturing, Optics manufacturing, Light sources, Laser stabilization, Pulsed laser operation

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Proceedings Article | 26 June 2003 Paper

Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Herve Besaucele, Fedor Trintchouk, A. Lukashev, Patrick O'Keeffe, Daniel Colon, Vladimir Fleurov, Alexander Ershov, R. Rafac, T. Ishihara, Paolo Zambon, Daniel Brown

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Proceedings Article | 29 June 1998 Paper

Paper

ArF lasers for production of semiconductor devices with CD<0.15 um

Toshihiko Ishihara, Todd Embree, Tom Watson, Thomas Duffey, Richard Morton, Richard Sandstrom, William Partlo

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310731

KEYWORDS: Lithography, Laser applications, Pulsed laser operation, Semiconductors, Excimer lasers, Laser stabilization, Optical damage, Semiconductor lasers, Diffraction gratings, Pulsed power

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Proceedings Article | 8 August 1993 Paper

Paper

Parametric studies and the operating latitude of a spectrally narrowed KrF excimer laser for the deep-UV stepper

Richard Sandstrom, Uday Sengupta, Toshihiko Ishihara

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150430

KEYWORDS: Electrodes, Pulsed laser operation, Fluorine, Excimer lasers, Laser stabilization, Energy efficiency, Lithography, Optical lithography, Gas lasers, Deep ultraviolet

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Proceedings Article | 1 June 1992 Paper

Paper

Advanced krypton fluoride excimer laser for microlithography

Richard Sandstrom, Uday Sengupta, Toshihiko Ishihara, Christopher Reiser

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130343

KEYWORDS: Optical lithography, Reliability, Excimer lasers, Power supplies, Gas lasers, Krypton, Pulsed laser operation, Safety, Nitrogen, Neon

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Showing 5 of 15 publications

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