Toshikage Asakura
at Ciba Specialty Chemicals KK
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 3 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Fluorine, Coating, Lithography, Chromophores, Polymers, Photoresist materials, Transparency, Chemically amplified resists, Carbon, Water

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Lithography, Line edge roughness, Photoresist materials, Coating, Scanning electron microscopy, Immersion lithography, Chemically amplified resists, Optical lithography, Absorption

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Polymers, Photoresist materials, Coating, Contamination, Immersion lithography, Quartz, Lithography, Transparency, Chemical species, Hydrogen

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Quantum efficiency, Photoresist materials, Polymers, Immersion lithography, Process modeling, Absorption, Lithography, Transparency, Ultraviolet radiation, Water

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Absorption, Photoresist materials, Polymers, Absorbance, Water, Ultraviolet radiation, Transparency, Lithography, Chemically amplified resists, Photomasks

Showing 5 of 8 publications
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