Dr. Tsann-Bim Chiou
Image Scientist at ASML Taiwan Ltd.
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 2 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Logic, Optical lithography, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Eye, Metrology, Optical lithography, Image processing, Control systems, Electroluminescence, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Metals, Image segmentation, Image processing, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Back end of line

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Image processing, Error analysis, Electroluminescence, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction, Optical alignment

Showing 5 of 24 publications
Conference Committee Involvement (2)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
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