Mr. Tsuneo Yamashita Profile

Tsuneo Yamashita

at Daikin Industries Ltd

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Author

Publications (13)

Proceedings Article | 28 March 2014 Paper

Novel fluorinated compounds that improve durability of antistick layer for quartz mold

Tsuneo Yamashita, Hisashi Mitsuhashi, Masamichi Morita, Shuso Iyoshi, Makoto Okada, Shinji Matsui

Proceedings Volume 9049, 90491Q (2014) https://doi.org/10.1117/12.2044448

KEYWORDS: Quartz, Nanoimprint lithography, Semiconducting wafers, Fluorine, Ultraviolet radiation, Printing, Rutherfordium, Silicon, Acquisition tracking and pointing, Lithography

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Proceedings Article | 26 March 2013 Paper

Novel fluorinated compounds for releasing material in nanoimprint lithography

Tsuneo Yamashita, Hisashi Mitsuhashi, Masamichi Morita

Proceedings Volume 8680, 86800D (2013) https://doi.org/10.1117/12.2011966

KEYWORDS: Quartz, Nanoimprint lithography, Polymers, Silicon, Semiconducting wafers, Printing, Lithography, Interfaces, Indium, Fluorine

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Proceedings Article | 16 April 2011 Paper

High-sensitivity EUV resists based on fluorinated polymers

Tsuneo Yamashita, Masamichi Morita, Yoshito Tanaka, Julius Joseph Santillan, Toshiro Itani

Proceedings Volume 7972, 79721G (2011) https://doi.org/10.1117/12.879568

KEYWORDS: Extreme ultraviolet, Polymers, Line width roughness, Lithography, Extreme ultraviolet lithography, Absorption, Fluorine, Materials processing, Chemical species, Deep ultraviolet

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Proceedings Article | 4 April 2008 Paper

Synthesis of novel alpha-fluoroacrylates and related polymers for immersion lithography

Tsuneo Yamashita, Takuji Ishikawa, Masamichi Morita, Takashi Kanemura, Hirokazu Aoyama

Proceedings Volume 6923, 69231Z (2008) https://doi.org/10.1117/12.772262

KEYWORDS: Polymers, Immersion lithography, Hydrogen, Polymerization, Surface properties, Infrared radiation, Manganese, Water, Spectroscopy, Absorption

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Proceedings Article | 30 March 2007 Paper

Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography

Tsuneo Yamashita, Takashi Hayami, Takuji Ishikawa, Takashi Kanemura, Hirokazu Aoyama

Proceedings Volume 6519, 65192U (2007) https://doi.org/10.1117/12.712414

KEYWORDS: Polymers, Reflectivity, Water, Lithography, Refractive index, Antireflective coatings, Standards development, Transparency, Fluorine, Quartz

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Proceedings Article | 29 March 2006 Paper

Novel fluorinated polymers for application in 193-nm lithography and 193-nm immersion lithography

Tsuneo Yamashita, Takuji Ishikawa, Tomohiro Yoshida, Takashi Hayami, Hirokazu Aoyama

Proceedings Volume 6153, 615325 (2006) https://doi.org/10.1117/12.656938

KEYWORDS: Polymers, Water, Immersion lithography, Standards development, Lithography, Transparency, Fluorine, Absorbance, Quartz, Crystals

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Proceedings Article | 4 May 2005 Paper

Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

T. Yamashita, T. Ishikawa, T. Yoshida, T. Hayamai, Takayuki Araki, H. Aoyama, T. Hagiwara, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599523

KEYWORDS: Polymers, Fluorine, Lithography, Immersion lithography, Transparency, Standards development, Quartz, Crystals, Photomasks, Polymerization

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Proceedings Article | 14 May 2004 Paper

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

Takuji Ishikawa, Tetsuhiro Kodani, Meiten Koh, Tsukasa Moriya, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Minoru Toriumi, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533901

KEYWORDS: Polymers, Transparency, Lithography, Fluorine, Absorbance, Photomasks, Standards development, Phase shifts, Polymer thin films, Absorption

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Proceedings Article | 14 May 2004 Paper

Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Takuji Ishikawa, Meiten Koh, Tetsuhiro Kodani, Tsukasa Moriya, Tsuneo Yamashita, Takayuki Araki, Minoru Toriumi, Hirokazu Aoyama

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535098

KEYWORDS: Polymers, Absorption, Lithography, Resistance, Absorbance, Line edge roughness, Fluorine, Industrial chemicals, Transparency, Chlorine

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Proceedings Article | 12 June 2003 Paper

Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani, Takuji Ishikawa, Meiten Koh, Takayuki Araki, Minoru Toriumi, T. Kodani, Hirokazu Aoyama, Tsuneo Yamashita

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485046

KEYWORDS: Polymers, Fluorine, Lithography, Transparency, Absorption, Polymerization, Standards development, Chemical species, Photoresist developing, Vacuum ultraviolet

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Proceedings Article | 12 June 2003 Paper

Novel main-chain-fluorinated polymers for 157-nm photoresists

Minoru Toriumi, Meiten Koh, Takuji Ishikawa, T. Kodani, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485085

KEYWORDS: Polymers, Transparency, Absorption, Polymerization, Resistance, Etching, Lithography, Fluorine, Standards development, Absorbance

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Proceedings Article | 12 June 2003 Paper

Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Meiten Koh, Takuji Ishikawa, Minoru Toriumi, Takayuki Araki, Tsuneo Yamashita, Hirokazu Aoyama, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485077

KEYWORDS: Polymers, Fluorine, Transparency, Absorbance, Absorption, Chemical species, Standards development, Photoresist materials, Spectroscopy, Vacuum ultraviolet

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Proceedings Article | 24 July 2002 Paper

Dry-etch resistance of fluorine functionalized polymers

Meiten Koh, Takuji Ishikawa, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Tamio Yamazaki, Hiroyuki Watanabe, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474246

KEYWORDS: Fluorine, Polymers, Etching, Dry etching, Chemical species, Resistance, Lithography, Carbon, Reactive ion etching, Data modeling

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Showing 5 of 13 publications

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