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Dr. Tzong-Shane Wu
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 4 March 2010 Paper
A novel decomposition of source kernel for OPC modeling
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Lithography, Lithographic illumination, Data modeling, Calibration, Projection systems, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers
Proceedings Article | 7 March 2008 Paper
Novel lithography rule check for full-chip side lobe detection
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Scattering, Printing, Photomasks, Optical proximity correction, Lutetium, Model-based design, Resolution enhancement technologies, Phase shifts
Proceedings Article | 20 March 2006 Paper
Dual antireflection layers for ARC/hard-mask applications
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Oxides, Lithography, Antireflective coatings, Optical lithography, Etching, Dielectrics, Interfaces, Reflectivity, Photomasks, Critical dimension metrology
Proceedings Article | 26 June 2003 Paper
Low-proximity contact hole formation by using double-exposure technology (DET)
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Optical lithography, Etching, Argon, Skin, Printing, Photomasks, Ion implantation, Photoresist processing, Resolution enhancement technologies
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