Dr. Ulrich Welling Profile

Dr. Ulrich Welling

at Synopsys GmbH

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 10 April 2024 Presentation + Paper

Advanced simulations using an improved metal oxide photoresist model

Craig Needham, Ulrich Welling, Amrit Narasimhan, Peter De Schepper, Lauren McQuade, Michael Kocsis, Lawrence Melvin, Jason Stowers, Stephen Meyers

Proceedings Volume 12957, 129571B (2024) https://doi.org/10.1117/12.3010941

KEYWORDS: Data modeling, Calibration, Thermal modeling, Performance modeling, Simulations, Photoresist materials, Metal oxides, Line width roughness, Mathematical modeling, Lithography

Read Abstract +

SPIE Journal Paper | 13 October 2023

Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness

Eisuke Ohtomi, Vicky Philipsen, Ulrich Welling, Lawrence Melvin, Yosuke Takahata, Yusuke Tanaka, Danilo De Simone

JM3, Vol. 22, Issue 04, 044801, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.044801

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Semiconducting wafers, Nanoimprint lithography, Light sources and illumination, Photoresist processing, Stochastic processes, Extreme ultraviolet, Scanners, Fourier transforms

Read Abstract +

Proceedings Article | 28 April 2023 Presentation + Paper

Electrical analysis of a stochastically simulated 2 nm node electrical test structure

Lawrence Melvin, Wolfgang Demmerle, Joachim Siebert, Phil Stopford, Sergey Zavadskiy, Renato Hentschke, Krishna Ramkumar, Sylvain Berthiaume, Yudhishthir Kandel, Wolfgang Hoppe, Ulrich Klostermann, Zachary Levinson, Hans-Jürgen Stock, Ulrich Welling

Proceedings Volume 12495, 124950W (2023) https://doi.org/10.1117/12.2658780

KEYWORDS: Stochastic processes, Resistance, Simulations, Overlay metrology, Optical lithography, Lithography, Optical proximity correction, Ruthenium, Etching

Read Abstract +

Proceedings Article | 28 April 2023 Paper

Mask absorber/tone and process impact on resist line-edge-roughness

Eisuke Ohtomi, Vicky Philipsen, Joren Severi, Ulrich Welling, Laurence Melvin, Yosuke Takahata, Yusuke Tanaka, Danilo De Simone

Proceedings Volume 12494, 1249410 (2023) https://doi.org/10.1117/12.2657287

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Light sources and illumination, Extreme ultraviolet, Scanners, 3D mask effects, Metal oxides, Optical simulations, Simulations

Read Abstract +

Proceedings Article | 28 April 2023 Presentation + Paper

Absorber material deficiency impact on a stochastically patterned wafer analyzed with a clustered model

Lawrence Melvin, Yudhishthir Kandel, Zachary Levinson, Ulrich Welling

Proceedings Volume 12494, 124940F (2023) https://doi.org/10.1117/12.2658777

KEYWORDS: Windows, Semiconducting wafers, Stochastic processes, Simulations, Ruthenium, Platinum, Alloys, SRAF, Composites, Critical dimension metrology

Read Abstract +

Proceedings Article | 25 May 2022 Presentation + Paper

Resist line edge roughness mitigation at high-NA EUVL

Eisuke Ohtomi, Vicky Phillipsen, Joren Severi, Ulrich Welling, Yusuke Tanaka, Danilo De Simone

Proceedings Volume 12055, 120550K (2022) https://doi.org/10.1117/12.2605822

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Stochastic processes, Scanners, Photoresist materials, Lithography, Semiconducting wafers

Read Abstract +

SPIE Journal Paper | 28 May 2021

Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles

Joren Severi, Ulrich Welling, Danilo De Simone, Stefan De Gendt

JM3, Vol. 20, Issue 02, 024601, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.024601

KEYWORDS: Calibration, Data modeling, Particles, Line edge roughness, 3D modeling, Fourier transforms, Extreme ultraviolet lithography, Optical lithography, Lithography, Critical dimension metrology

Read Abstract +

SPIE Journal Paper | 4 March 2021 Open Access

Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography

Zelalem Belete, Peter De Bisschop, Ulrich Welling, Andreas Erdmann

JM3, Vol. 20, Issue 01, 014801, (March 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.014801

KEYWORDS: Photoresist materials, Photoresist developing, Calibration, Line width roughness, Stochastic processes, Data modeling, Photons, Algorithm development, Molecules, Extreme ultraviolet lithography

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 15 May 2020 Presentation + Paper

An application study on the stochastic effect of EUV photons

Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi

Proceedings Volume 11323, 113231E (2020) https://doi.org/10.1117/12.2553319

KEYWORDS: Stochastic processes, Photomasks, Data modeling, Nanoimprint lithography, Line width roughness, Calibration, Extreme ultraviolet, Photons, Scanning electron microscopy, Line edge roughness

Read Abstract +

Proceedings Article | 24 March 2020 Presentation

Rigorous stochastic lithography modelling for defectivity reduction in EUV single expose patterning (Conference Presentation)

Ulrich Welling

Proceedings Volume 11323, 1132318 (2020) https://doi.org/10.1117/12.2551876

Read Abstract +

Proceedings Article | 23 March 2020 Presentation + Paper

Prediction of EUV stochastic microbridge probabilities by lithography simulations

Erik Verduijn, Ulrich Welling, Jiuzhou Tang, Hans-Jürgen Stock, Ulrich Klostermann, Wolfgang Demmerle, Peter De Bisschop

Proceedings Volume 11323, 113230K (2020) https://doi.org/10.1117/12.2552236

KEYWORDS: Data modeling, Lithography, Stochastic processes, Calibration, Extreme ultraviolet lithography, Extreme ultraviolet, 3D modeling, Scanning electron microscopy, Photomasks, Nanoimprint lithography

Read Abstract +

Proceedings Article | 23 March 2020 Presentation + Paper

Calibration of a MOx-specific EUV photoresist lithography model

Craig Needham, Amrit Narasimhan, Ulrich Welling, Lawrence Melvin, Peter De Schepper, Joren Wouters, Joren Severi, Danilo De Simone, Stephen Meyers

Proceedings Volume 11323, 113230G (2020) https://doi.org/10.1117/12.2552151

KEYWORDS: Data modeling, Calibration, Lithography, Monte Carlo methods, Stochastic processes, Extreme ultraviolet lithography, Photoresist processing, Line width roughness, Systems modeling, Photoresist materials

Read Abstract +

Proceedings Article | 26 March 2019 Presentation + Paper

Impact of EUV absorber variations on wafer patterning

Lawrence Melvin, Yudhishthir Kandel, Tim Fühner, Ulrich Welling, Emily Gallagher, Andreas Frommhold, Yoshitake Shusuke

Proceedings Volume 10957, 109570N (2019) https://doi.org/10.1117/12.2515511

KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Extreme ultraviolet, Atomic force microscopy, Critical dimension metrology, Optical lithography, Data modeling, Multilayers

Read Abstract +

Proceedings Article | 6 September 2018 Paper

Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly

Balint Meliorisz, Kafai Lai, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha, Chi-chun Liu, Cheng Chi, Jing Guo, Clifford Osborn, Jaime Morillo, Wolfgang Demmerle, Derren Dunn

Proceedings Volume 10586, 105860R (2018) https://doi.org/10.1117/12.2297344

KEYWORDS: Metals, Directed self assembly, Critical dimension metrology, Calibration, Error analysis, Etching, Computer simulations, Process modeling, Optical lithography, Extreme ultraviolet lithography

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years