Dr. Ulrich Welling Profile

Dr. Ulrich Welling

at Synopsys GmbH

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 15 May 2020 Presentation + Paper

An application study on the stochastic effect of EUV photons

Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Data modeling, Calibration, Photons, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Nanoimprint lithography, Line edge roughness, Stochastic processes

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Proceedings Article | 24 March 2020 Presentation

Rigorous stochastic lithography modelling for defectivity reduction in EUV single expose patterning (Conference Presentation)

Ulrich Welling

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

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Proceedings Article | 23 March 2020 Presentation + Paper

Calibration of a MOx-specific EUV photoresist lithography model

Craig Needham, Amrit Narasimhan, Ulrich Welling, Lawrence Melvin, Peter De Schepper, Joren Wouters, Joren Severi, Danilo De Simone, Stephen Meyers

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Lithography, Data modeling, Calibration, Photoresist materials, Monte Carlo methods, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Systems modeling

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Proceedings Article | 23 March 2020 Presentation + Paper

Prediction of EUV stochastic microbridge probabilities by lithography simulations

Erik Verduijn, Ulrich Welling, Jiuzhou Tang, Hans-Jürgen Stock, Ulrich Klostermann, Wolfgang Demmerle, Peter De Bisschop

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Stochastic processes

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Proceedings Article | 26 March 2019 Presentation + Paper

Impact of EUV absorber variations on wafer patterning

Lawrence Melvin, Yudhishthir Kandel, Tim Fühner, Ulrich Welling, Emily Gallagher, Andreas Frommhold, Yoshitake Shusuke

Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X

KEYWORDS: Multilayers, Optical lithography, Data modeling, Atomic force microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

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Showing 5 of 6 publications

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