Uzodinma Okoroanyanwu is a research associate professor in the department of polymer science and engineering of University of Massachusetts at Amherst. His research interests are broadly geared toward the application of electrochemistry, materials science, and lithography to the development of electronic instruments and materials used in electrochemical energy storage; multi-parametric sensing; printed, flexible, flexible/hybrid and wearable electronics; and electromagnetic interference shielding. He is also the founder of Enx Labs, a company that translates his research results into devices and instruments that help to improve the human condition and sustain the environment. He worked previously at Advanced Micro Devices, where he spent 12 years conducting research on advanced lithography and on organic polymer memories, and at GLOBALFOUNDRIES, where he spent 4 years conducting research on advanced lithography. He has published extensively on lithography science and technology and on electronic applications of polymers. His books include "Chemistry and Lithography, 2nd ed, Vol. 1: The Chemical History of Lithography" (SPIE Press, 2020); "Molecular Theory of Lithography" (SPIE Press, 2015); and "Chemistry and Lithography" (SPIE Press & John-Wiley & Sons, 2010). A holder of 37 U.S patents, he was educated at The University of Texas at Austin, where he earned the following degrees: Ph.D. physical chemistry (1997), M.S. chemical engineering (1995), M.A. physical chemistry (1994), B.S. Chemistry and Chemical engineering (1991).
Production aspects of 45nm immersion lithography defect monitoring using laser DUV inspection methodology
Initial experience establishing an EUV baseline lithography process for manufacturability assessment
Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157nm reticles and vacuum-UV cleaning
Impact of photo-induced species in O2-containing gases on lithographic patterning at 193-nm wavelength
Impact of optical absorption on process control for sub-0.15-nm device patterning using 193-nm lithography
Defect printability for sub-0.18-micron design rules using 193-nm lithography process and binary OPC reticle
Novel functional nortricyclene polymers and copolymers for 248- and 193-nm chemically amplified resists