Mr. Vadims Kolbjonoks Profile

Vadims Kolbjonoks

at Daugavpils Univ

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Author

Publications (5)

Proceedings Article | 31 May 2023 Poster + Paper

Chalcogenide thin films as a material for holographic applications

Vadims Kolbjonoks, Indrikis Krams

Proceedings Volume 12574, 1257412 (2023) https://doi.org/10.1117/12.2665687

KEYWORDS: Thin films, Holograms, 3D image reconstruction, Etching, Chemical elements, Chalcogenides, Diffractive optical elements, Electron beams, Electron beam lithography, Holography

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Proceedings Article | 3 October 2022 Poster + Paper

A method for modifying the surface properties of ZnO nanowires deposited as thin films on various substrates

Vadims Kolbjonoks, Vladimirs Kostjukevičs

Proceedings Volume 12202, 122020C (2022) https://doi.org/10.1117/12.2633401

KEYWORDS: Zinc oxide, Thin films, Nanowires, Gases, Thin film deposition, Switching, Surface properties, Scanning electron microscopy

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Proceedings Article | 3 May 2013 Paper

The 'hidden image' effect in security holograms and its personalization by laser demetallization

Andrejs Bulanovs, Edmunds Tamanis, Vadims Kolbjonoks

Proceedings Volume 8776, 87760R (2013) https://doi.org/10.1117/12.2017135

KEYWORDS: Holograms, Diffraction, 3D image reconstruction, Visualization, Diffraction gratings, Information security, Optical recording, Digital holography, Holography, Scanning electron microscopy

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Proceedings Article | 26 July 2011 Paper

Fabrication of gratings and optical diffractive elements on chalcogenide thin films

Vadims Kolbjonoks, Vjaceslavs Gerbreders, Janis Teteris, Andrejs Bulanovs

Proceedings Volume 8001, 80012P (2011) https://doi.org/10.1117/12.892173

KEYWORDS: Thin films, Diffraction gratings, Chalcogenides, Electron beam lithography, Chemical elements, Optical components, Etching, Diffraction, Electron beams, Chalcogenide glass

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Proceedings Article | 11 May 2011 Paper

Amorphous As-S-Se semiconductor thin films for holography and lithography

Vadims Kolbjonoks, Vjaceslavs Gerbreders, Janis Teteris, Andrejs Bulanovs

Proceedings Volume 8074, 80740U (2011) https://doi.org/10.1117/12.886837

KEYWORDS: Etching, Thin films, Electron beam lithography, Amorphous semiconductors, Semiconductors, Chalcogenides, Holography, Lithography, Diffractive optical elements, Electron beams

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