Dr. Vaishali Vohra Profile

Dr. Vaishali Vohra

Strategic Account Manager at DuPont Electronics & Industrial

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Publications (7)

Proceedings Article | 16 April 2011 Paper

Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)

Dario Goldfarb, Larry Zhuang, Jason Meiring, Michael Reilly, Karen Petrillo, Sean Burns, Martin Burkhardt, Guillaume Landie, Yongan Xu, Matthew Colburn, Kenji Yoshimoto, Cecily Andes, Anthony Scaduto, Young Bae, Vaishali Vohra, Martin Glodde, Jason Desisto

Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843

KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

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Proceedings Article | 26 March 2010 Paper

Evolution of thermal cure resist for double patterning applications

Matthew Colburn, Michael Reilly, Vaishali Vohra, Young Bae, Chiew-Seng Koay

Proceedings Volume 7639, 76392W (2010) https://doi.org/10.1117/12.846748

KEYWORDS: Double patterning technology, Lithography, Photoresist processing, Semiconducting wafers, Electroluminescence, Astatine, Semiconductors, Image processing, Etching, Polymers

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Proceedings Article | 31 March 2008 Paper

Non-topcoat resist design for immersion process at 32-nm node

Bo-Jou Lu, Steven Wu, Vaishali Vohra, Cheng Bai Xu, Stefan Caporale, Bill Lin, Aroma Tseng, Chun Chi Yu, Deyan Wang, Wen-Shiang Liao, George Barclay

Proceedings Volume 6923, 692307 (2008) https://doi.org/10.1117/12.775542

KEYWORDS: Electron beam lithography, Photoresist processing, Polymers, Semiconducting wafers, Lithography, Immersion lithography, Water, Surface properties, Surface roughness, Thin film coatings

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Proceedings Article | 29 March 2006 Paper

A novel switchable BARC (SBARC) and process to improve pattern collapse and defect control

Gerald Wayton, Vaishali Vohra, James Thackeray, John C. H. Lin, Tomoki Kurihara, Ching Yu Chang, Burn Lin, D. C. Yu, J. H. Chen

Proceedings Volume 6153, 61530M (2006) https://doi.org/10.1117/12.658416

KEYWORDS: Satellites, Water, Etching, Adhesives, Capillaries, Polymers, Digital watermarking, Photoresist processing, Lithography, Switches

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Proceedings Article | 28 May 2004 Paper

Advances in vortex via fabrication

George Barclay, Takeaki Ebihara, Carolyne Stafford, Vaishali Vorha, Naoya Hayashi, Yasutaka Morikawa, Marc Levenson, Michael Reilly, Martin Mastovich

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535652

KEYWORDS: Photomasks, Cadmium sulfide, Semiconducting wafers, Spiral phase plates, Critical dimension metrology, Optical vortices, Distortion, Optical lithography, Phase shifts, Scanning electron microscopy

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Proceedings Article | 12 June 2003 Paper

Fluoropolymer resists for 157-nm lithography

Paul Zimmerman, Vaishali Vohra, Will Conley, Christopher Ober, Daniel Miller, Xiang-Qian Liu, Katsuji Douki

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485097

KEYWORDS: Polymers, Silicon, Fluorine, Lithography, Transparency, Polymerization, Absorbance, Photoresist materials, Resistance, Scanning electron microscopy

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Proceedings Article | 24 July 2002 Paper

Highly transparent resist platforms for 157-nm microlithography: an update

Katsuji Douki, Daniel Miller, Paul Zimmerman, Will Conley, Young-Je Kwark, Christopher Ober, Young Bae, Xiang-Qian Liu, Vaishali Vohra

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474169

KEYWORDS: Polymers, Fluorine, Transparency, Polymerization, Etching, Lithography, Resistance, Absorbance, Scanning electron microscopy, Photoresist materials

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Showing 5 of 7 publications

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