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Dr. Varun Mohan
at Intel Corp
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Publications (1)
Proceedings Article | 21 November 2023 Presentation + Paper
Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks
Deepan Kishore Kumar, Varun Mohan, Hatsey Frezghi, Adam Seeger, Malahat Tavassoli, Masayuki Kuribara, Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai
Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660
KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles
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