Prof. Vasu Ramaswamy Profile

Prof. Vasu Ramaswamy

Graduate Research Assistant at Univ of Wisconsin-Madison

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Author

Publications (5)

SPIE Journal Paper | 1 October 2009

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for extreme ultraviolet lithography

Michael Sogard, Andrew Mikkelson, Vasu Ramaswamy, Roxann Engelstad

JM3, Vol. 8, Issue 04, 041506, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238518

KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

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Proceedings Article | 18 March 2009 Paper

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for EUV lithography

Michael Sogard, Andrew Mikkelson, Vasu Ramaswamy, Roxann Engelstad

Proceedings Volume 7271, 72710H (2009) https://doi.org/10.1117/12.815402

KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

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Proceedings Article | 20 October 2006 Paper

Predicting the influence of trapped particles on EUVL reticle distortion during exposure chucking

Vasu Ramaswamy, Kevin Turner, Roxann Engelstad, Edward Lovell

Proceedings Volume 6349, 634938 (2006) https://doi.org/10.1117/12.686145

KEYWORDS: Particles, Reticles, Dielectrics, Extreme ultraviolet lithography, Distortion, Particle systems, Photomasks, Data modeling, Glasses, Semiconducting wafers

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Proceedings Article | 21 June 2006 Paper

Characterizing the response of an EUV reticle during electrostatic chucking

Roxann Engelstad, Edward Lovell, Andrew Mikkelson, Madhura Nataraju, Vasu Ramaswamy, Jaewoong Sohn, Gerald Dicks, Amr Abdo, Richard Tejeda

Proceedings Volume 6281, 628107 (2006) https://doi.org/10.1117/12.692727

KEYWORDS: Reticles, Particles, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Data modeling, Zerodur, Glasses, 3D modeling, Thermal modeling

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Proceedings Article | 8 November 2005 Paper

Predicting wafer-level IP error due to particle-induced EUVL reticle distortion during exposure chucking

Vasu Ramaswamy, Andrew Mikkelson, Roxann Engelstad, Edward Lovell

Proceedings Volume 5992, 59923T (2005) https://doi.org/10.1117/12.631362

KEYWORDS: Reticles, Particles, Distortion, Extreme ultraviolet lithography, Particle contamination, Semiconducting wafers, Photomasks, Finite element methods, Error analysis, Glasses

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