Ms. Vera Zhuang Profile

Vera Zhuang

Research Scientist at KLA Corp

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Publications (3)

Proceedings Article | 23 March 2009 Paper

Dark-field optical scatterometry for line-width-roughness metrology

G. Vera Zhuang, Steven Spielman, Leonid Poslavsky, Benjamin Bunday, Daniel Wack, John Fielden

Proceedings Volume 7272, 72720L (2009) https://doi.org/10.1117/12.813007

KEYWORDS: Line width roughness, Critical dimension metrology, Light scattering, Line edge roughness, Scattering, Semiconducting wafers, Scanning electron microscopy, Metrology, Scatterometry, Diffraction

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Proceedings Article | 24 March 2008 Paper

Opportunities and challenges for optical CD metrology in double patterning process control

Walter Mieher, John Fielden, Vera Zhuang, John Hench, Ted Dziura, Daniel Wack, Leonid Poslavsky

Proceedings Volume 6922, 69221N (2008) https://doi.org/10.1117/12.772997

KEYWORDS: Metrology, Process control, Etching, Critical dimension metrology, Systems modeling, Spectroscopy, Double patterning technology, Optical lithography, Performance modeling, Reflectometry

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Proceedings Article | 16 July 2002 Paper

Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM

Vera Zhuang, Wei Liu, David Mui, Roger Lowe-Webb, Hiroki Sasano, Rahul Korlahalli, Weidong Yang

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473425

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Diffraction gratings, Diffraction, Reflectivity, Finite element methods, Spectroscopy, Polarizers

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