Ms. Vera Zhuang Profile

Vera Zhuang

Research Scientist at KLA Corp

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 23 March 2009 Paper

Dark-field optical scatterometry for line-width-roughness metrology

G. Vera Zhuang, Steven Spielman, John Fielden, Daniel Wack, Leonid Poslavsky, Benjamin Bunday

Proceedings Volume 7272, 72720L (2009) https://doi.org/10.1117/12.813007

KEYWORDS: Line width roughness, Critical dimension metrology, Light scattering, Line edge roughness, Scattering, Semiconducting wafers, Scanning electron microscopy, Metrology, Scatterometry, Diffraction

Read Abstract +

Proceedings Article | 24 March 2008 Paper

Opportunities and challenges for optical CD metrology in double patterning process control

Daniel Wack, John Hench, Leonid Poslavsky, John Fielden, Vera Zhuang, Walter Mieher, Ted Dziura

Proceedings Volume 6922, 69221N (2008) https://doi.org/10.1117/12.772997

KEYWORDS: Metrology, Process control, Etching, Critical dimension metrology, Systems modeling, Spectroscopy, Double patterning technology, Optical lithography, Performance modeling, Reflectometry

Read Abstract +

Proceedings Article | 16 July 2002 Paper

Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM

Weidong Yang, Roger Lowe-Webb, Rahul Korlahalli, Vera Zhuang, Hiroki Sasano, Wei Liu, David Mui

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473425

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Diffraction gratings, Diffraction, Reflectivity, Finite element methods, Spectroscopy, Polarizers

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years