Mr. Victor E. Densmore Profile

Victor E. Densmore

at Ruda Optical

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 1 October 2024 Presentation + Paper

Correlations between wavefront data and image quality metrics in toleranced high-performance imaging systems

R. Hamilton, Martin Tangari Larrategui, Lee Johnson, Victor Densmore, Tilman Stuhlinger, Kenneth Castle, Kate Medicus

Proceedings Volume 13129, 1312904 (2024) https://doi.org/10.1117/12.3028341

KEYWORDS: Modulation transfer functions, Data modeling, Wavefronts, Tolerancing, Image quality, Lenses, Point spread functions, Monte Carlo methods, Imaging systems

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Ruda designs high performance imaging systems to meet difficult mission requirements, but these nearly diffraction limited systems often have small margins between the image quality of the nominal design and the required performance of the as-built system. Due to this we may spend significant resources designing and operating specialized test setups to ensure that results of MTF and Ensquared Energy (EE) measurements are well-calibrated and accurate. Alternatively, wavefront measurements – like those captured by wavefront sensors and interferometers – can be taken of the system to characterize the quality of the as-built system. Wavefront measurements are typically higher resolution, faster to setup, and quicker to measure than image quality metrics, making them particularly attractive for use when validating as-built system quality. Since the wavefront is related to the point spread function, and thereby the image quality, different wavefront measurements can contain information about the system MTF and EE. Thus, if the relationship between the wavefront and image quality metrics of interest can be established for an as-built system, it is possible to supplement or fully validate MTF and EE requirements from wavefront measurements. To investigate this relationship, we used Zemax OpticStudio to generate toleranced Monte Carlo trials of two nearly diffraction limited imaging systems designed by Ruda. The Monte Carlo models were then analyzed to form large data sets for statistical analysis. For wavefront data, the simulation produces single pass and double pass wavefront Zernike decompositions as well as wavefront root mean squared error over a range of object fields and visible wavelengths. For image quality data, the MTF at three spatial frequencies and the EE at two integration lengths are computed for the same fields and wavelengths as the wavefront data. These data sets are then processed to demonstrate that high degrees of correlation can exist between wavefront data and image quality metrics in toleranced high performance imaging systems, even when there is a difference in wavelength between the metrics. Sources of noise in these correlations are identified, and paths for supplementing or validating image quality requirement with correlated wavefront measurement data through machine learning are discussed.

Proceedings Article | 28 September 2023 Presentation + Paper

Optomechanical analysis of the alignment tolerance of threaded lens mounts

Martin Tangari Larrategui, Bianka Camacho, Paul Tulungen, Christian Baker, Victor Densmore, Lee Johnson, R. Hamilton, Kate Medicus, Kenneth Castle, Tilman Stuhlinger, Peter Mc. Niven

Proceedings Volume 12669, 126690G (2023) https://doi.org/10.1117/12.2677427

KEYWORDS: Tolerancing, Interfaces, Standards development, Cameras, Detector arrays, Optics manufacturing, Manufacturing, Image quality, Optical alignment, Sensors

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Proceedings Article | 3 October 2022 Presentation + Paper

Optomechanical analysis of compliant spacers in passively athermalized drop-in optical systems

Martin Tangari Larrategui, Victor Densmore, Lee Johnson, Christian Baker, Matthew Hevert, Bianka Camacho, Paul Tulungen, Peter McNiven, Kate Medicus, Kenneth Castle, Tilman Stuhlinger

Proceedings Volume 12222, 122220A (2022) https://doi.org/10.1117/12.2633612

KEYWORDS: Optomechanical design, Modulation transfer functions, Glasses, Mechanical engineering, Optical design, Metals, Tolerancing

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Proceedings Article | 20 August 2020 Presentation + Paper

Sensitivity analysis of the CTE and thermo-optical coefficients of a passively athermalized lens

Martin Tangari Larrategui, Victor Densmore, Lee Johnson, Christopher Giokaris, Kate Medicus, Kenneth Castle, Tilman Stuhlinger

Proceedings Volume 11488, 1148809 (2020) https://doi.org/10.1117/12.2569759

KEYWORDS: Glasses, Tolerancing, Imaging systems, Wavefronts, Refractive index, Aluminum, Optical components, Temperature metrology, Optics manufacturing

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Proceedings Article | 19 September 2018 Paper

As-fab elements: design vs. reality

Victor Densmore, Christopher Shanor, Isela Howlett, Kate Medicus, Tilman Stuhlinger, Kenneth Castle

Proceedings Volume 10747, 107470G (2018) https://doi.org/10.1117/12.2324941

KEYWORDS: Spherical lenses, Tolerancing, Zemax, Plano

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Proceedings Article | 27 August 2015 Paper

Optomechanical design and tolerance of a microscope objective at 121.6 nm

Derek Keyes, Thiago Jota, Weichuan Gao, Dakota Luepke, Victor Densmore, Young-Sik Kim, Gun-Hee Kim, Thomas Milster

Proceedings Volume 9575, 957506 (2015) https://doi.org/10.1117/12.2188803

KEYWORDS: Mirrors, Objectives, Microscopes, Tolerancing, Optomechanical design, Diffraction, Laser induced fluorescence, Optical components, Microscopy, Control systems

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Proceedings Article | 5 September 2014 Paper

A high-NA solid immersion objective for imaging a Blue-ray disc and investigating subsurface damage

Victor Densmore, Young Sik Kim, Tom Milster, Matt Watson, Dolaphine Kwok

Proceedings Volume 9201, 92010Q (2014) https://doi.org/10.1117/12.2062255

KEYWORDS: Objectives, Solids, Optical storage, Aspheric lenses, Tolerancing, Microscopes, Light emitting diodes, Dielectrics, Zemax, Plano

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SPIE Journal Paper | 6 August 2014

Central aperture detection for auto direct read-write photoresist fabrication and inspection

Justin Sierchio, Melissa Zaverton, Lee Johnson, Victor Densmore, Thomas Milster

OE, Vol. 53, Issue 08, 084104, (August 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.8.084104

KEYWORDS: Image processing, Inspection, Raster graphics, Photoresist materials, Defect detection, Sensors, Digital filtering, Optical lithography, Laser scanners, Image registration

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Proceedings Article | 21 May 2011 Paper

Numerical comparison of grid pattern diffraction effects through measurement and modeling with OptiScan software

Ian Murray, Victor Densmore, Vaibhav Bora, Matthew Pieratt, Douglas Hibbard, Tom Milster

Proceedings Volume 8016, 80160U (2011) https://doi.org/10.1117/12.883422

KEYWORDS: Diffraction, Resistance, Electro optical modeling, Electro optics, Computing systems, Image transmission, Electromagnetic interference, Electromagnetic coupling, Algorithms, Interference (communication)

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Showing 5 of 9 publications

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