Mr. Vidyasagar Anantha Profile

Vidyasagar Anantha

at KLA Corp

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Publications (5)

Proceedings Article | 11 November 2022 Presentation

Reticle qualification and re-qualification for EUV production today and in the future

Mingwei Li, Amo Chen, Vidyasagar Anantha, Ray Shi

Proceedings Volume PC12293, PC122930F (2022) https://doi.org/10.1117/12.2650339

KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Photomasks, Wafer inspection, Semiconducting wafers, Optics manufacturing, Manufacturing, High volume manufacturing, EUV optics

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Proceedings Article | 8 October 2020 Presentation + Paper

High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification

Andrew Cross, Kaushik Sah, Vidyasagar Anantha, Balarka Gupta, Ramon Ynzunza, Neil Troy, Kenong Wu, Raghav Babulnath, Meghna Rajendran, Dieter Van den Heuvel, Philippe Leray

Proceedings Volume 11517, 115170U (2020) https://doi.org/10.1117/12.2572912

KEYWORDS: Reticles, Inspection, Wafer inspection, Wafer-level optics, Photomasks, Plasma, Semiconducting wafers, Signal to noise ratio, Algorithm development, Optics manufacturing

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Proceedings Article | 23 March 2020 Paper

Optical defect inspection solution for EUV stochastics detection

Vidyasagar Anantha, Raghav Babulnath, Veikunth Kannan, Garima Sharma, Shubham Kumar, Kaushik Sah, Andrew Cross, Rahul Lakhawat, Hari Pathangi, Peter De Bisschop

Proceedings Volume 11323, 113231J (2020) https://doi.org/10.1117/12.2552452

KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Semiconducting wafers, Modulation, EUV optics, Defect inspection, Wafer-level optics, Defect detection

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Proceedings Article | 3 October 2018 Paper

EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems

Kaushik Sah, Andrew Cross, Martin Plihal, Vidyasagar Anantha, Raghav Babulnath, Derek Fung, Peter De Bisschop, Sandip Halder

Proceedings Volume 10809, 1080909 (2018) https://doi.org/10.1117/12.2501825

KEYWORDS: Stochastic processes, Inspection, Scanning electron microscopy, Optical inspection, Photomasks, Etching, Extreme ultraviolet, Semiconducting wafers, Printing, Critical dimension metrology

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Proceedings Article | 16 October 2017 Paper

EUV reticle print verification with advanced broadband optical wafer inspection and e-Beam review systems

Ravikumar Sanapala, Andrew Cross, Moshe Preil, Jin Qian, Shishir Suman, Vidyasagar Anantha, Kaushik Sah, Scott Eitapence, Danilo De Simone, Dieter Van den Heuvel, Philippe Foubert

Proceedings Volume 10451, 104510L (2017) https://doi.org/10.1117/12.2281632

KEYWORDS: Semiconducting wafers, Photomasks, Inspection, Wafer-level optics, Extreme ultraviolet, Reticles, Optical inspection, Oxides, Wafer inspection, Signal to noise ratio

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