Vincent Arnoux
at ASML
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 30 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Databases, Manufacturing, Data processing, Design for manufacturing, Extreme ultraviolet, Optical proximity correction, Optical calibration, Model-based design, Process modeling, Standards development

Proceedings Article | 4 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photovoltaics, Modulation, Metals, Control systems, Photomasks, Beam shaping, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, SRAF, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 1 October 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Visualization, Metals, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Logic, Scanning electron microscopy, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

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