Dr. Vincent Wiaux
Researcher at imec
SPIE Involvement:
Author
Publications (47)

Proceedings Article | 4 January 2021 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Semiconductors, Metrology, Optical lithography, Etching, Scanners, Ecosystems, Image quality, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reticles, Imaging systems, Image resolution, Photomasks, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Microscopes, Light sources, Reticles, Optical lithography, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Microscopes, Reticles, Stereoscopy, Solids, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, 3D image processing

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 47 publications
Conference Committee Involvement (1)
Photomask Technology
18 September 2007 | Monterey, California, United States
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