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Vinod K Malhotra
Director R&D at Siemens EDA
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Publications (4)
Proceedings Article | 3 May 2004 Paper
Hybrid AAPSM compliance methodology to ensure design for manufacturing
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.561828
KEYWORDS: Photomasks, Phase shifts, Lithography, Resolution enhancement technologies, Manufacturing, Transistors, Semiconductors, Optical proximity correction, Design for manufacturing, 193nm lithography
Proceedings Article | 10 July 2003 Paper
Creation and verification of phase-compliant SoC IP for the fabless COT designers
Vinod Malhotra, Nahid King, Raymond Leung, Zain Zia, Shakeel Jeeawoody
Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485257
KEYWORDS: Phase shifts, System on a chip, Semiconductors, Optical proximity correction, Photomasks, Commercial off the shelf technology, Image enhancement, Transistors, Logic, Manufacturing
Proceedings Article | 10 July 2003 Paper
Design-to-process integration: optimizing 130-nm X architecture manufacturing
Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485258
KEYWORDS: Optical proximity correction, Photomasks, Reticles, Manufacturing, Inspection, Metals, Semiconducting wafers, Lithography, Silicon, Critical dimension metrology
Proceedings Article | 26 July 1999 Paper
Verifying the "correctness" of your optical proximity correction designs
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354315
KEYWORDS: Optical proximity correction, Process modeling, Semiconducting wafers, Photomasks, Lithography, Calibration, Optics manufacturing, Critical dimension metrology, Optical design, Deep ultraviolet
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