Dr. Vitaly Domnenko Profile

Dr. Vitaly Domnenko

Staff R&D Engineer

SPIE Involvement:

Author

Area of Expertise:

computational lithography , optical image formation , resolution enhancement technique , source mask optimization , electro-magnetic solvers , rigorous simulations

Publications (16)

Proceedings Article | 4 April 2019 Paper

Paper

EUV computational lithography using accelerated topographic mask simulation

Vitaly Domnenko, Bernd Küchler, Wolfgang Hoppe, Jürgen Preuninger, Ulrich Klostermann, Wolfgang Demmerle, Martin Bohn, Dietmar Krüger, Ryoung Ryoung Han Kim, Ling Ee Tan

Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII

KEYWORDS: Lithography, Computer simulations, 3D modeling, Photomasks, Extreme ultraviolet, Computational lithography, Optical proximity correction, Photoresist processing, Performance modeling, Resolution enhancement technologies

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Proceedings Article | 20 March 2018 Paper

Paper

Rigorous ILT optimization for advanced patterning and design-process co-optimization

Kosta Selinidis, Bernd Kuechler, Howard Cai, Kyle Braam, Wolfgang Hoppe, Vitaly Domnenko, Amyn Poonawala, Guangming Xiao

Proc. SPIE. 10587, Optical Microlithography XXXI

KEYWORDS: Lithography, Optical lithography, Calibration, Manufacturing, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Photoresist processing

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Proceedings Article | 27 March 2014 Paper

Paper

Numerical analysis for resist profile after thermal process in display manufacturing

Vitaliy Domnenko, Hans-Jürgen Stock, Sangmin Shin, Jonghyoek Ryu, Sung Won Choi, Hyunwoo Cho, Eun-Soo Jeong, Jung-Hoe Choi

Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI

KEYWORDS: Data modeling, Calibration, Polymers, Crystals, Materials processing, Manufacturing, 3D modeling, Numerical analysis, Solids, Photoresist processing

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Proceedings Article | 13 March 2012 Paper

Paper

Source-mask optimization incorporating a physical resist model and manufacturability constraints

Thomas Mülders, Vitaliy Domnenko, Bernd Küchler, Hans-Jürgen Stock, Ulrich Klostermann, Peter De Bisschop

Proc. SPIE. 8326, Optical Microlithography XXV

KEYWORDS: Lithography, Calibration, Manufacturing, Printing, Photomasks, Source mask optimization, SRAF, Optimization (mathematics), Photoresist processing, Semiconducting wafers

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Proceedings Article | 13 March 2012 Paper

Paper

Computational process optimization of array edges

Bernd Küchler, Artem Shamsuarov, Thomas Mülders, Ulrich Klostermann, Seung-Hune Yang, Seongho Moon, Vitaliy Domnenko, Sung-Woon Park

Proc. SPIE. 8326, Optical Microlithography XXV

KEYWORDS: Lithography, Manufacturing, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Tolerancing, Array processing

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Proceedings Article | 20 May 2011 Paper

Paper

Role of ellipsometry in DPT process characterization and impact of performance for contact holes

Itaru Kamohara, Vitaliy Domnenko, Alexander Philippou

Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII

KEYWORDS: Wafer-level optics, Ellipsometry, Lithography, Diffraction, Etching, Signal processing, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Signal detection

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Proceedings Article | 23 March 2011 Paper

Paper

Source and mask optimization applications in manufacturing

ChinTeong Lim, Vlad Temchenko, Ulrich Klostermann, Vitaliy Domnenko, Jens Schneider, Daniel Sarlette, Ingo Meusel, Dieter Kaiser, Ralf Ploss

Proc. SPIE. 7973, Optical Microlithography XXIV

KEYWORDS: Lithography, Photovoltaics, Reticles, Scanners, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Resolution enhancement technologies, Fiber optic illuminators

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Proceedings Article | 25 September 2010 Paper

Paper

Simultaneous source-mask optimization: a numerical combining method

Thomas Mülders, Vitaliy Domnenko, Bernd Küchler, Thomas Klimpel, Hans-Jürgen Stock, Amyn Poonawala, Kunal Taravade, William Stanton

Proc. SPIE. 7823, Photomask Technology 2010

KEYWORDS: Lithography, Image processing, Manufacturing, Electroluminescence, Photomasks, Cadmium sulfide, Source mask optimization, Optical proximity correction, Optimization (mathematics), Semiconducting wafers

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Proceedings Article | 4 March 2010 Paper

Paper

The role of mask topography effects in the optimization of pixelated sources

Vitaliy Domnenko, Bernd Küchler, Thomas Mülders, Thomas Schmöller, Hans-Jürgen Stock, Georg Viehöver

Proc. SPIE. 7640, Optical Microlithography XXIII

KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Error analysis, Photomasks, Nanoimprint lithography, Optimization (mathematics), Semiconducting wafers, Tolerancing

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Proceedings Article | 18 March 2009 Paper

Paper

Analysis of EUVL mask effects under partially coherent illumination

Vitaly Domnenko, Thomas Schmoeller, Thomas Klimpel

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Lithography, Diffraction, Lithographic illumination, Image processing, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum

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Proceedings Article | 1 November 2007 Paper

Paper

OPC verification on cell level using fully rigorous mask topography simulation

Vitaly Domnenko, Thomas Klimpel, Georg Viehoever, Hans Koop, Lawrence Melvin, Thomas Schmoeller

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Lithography, Finite-difference time-domain method, 3D acquisition, Polarization, Image processing, 3D modeling, Photomasks, Optical proximity correction, Electromagnetism, 3D image processing

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Proceedings Article | 18 February 2004 Paper

Paper

New object-oriented model of an arbitrary optical system

Vitaly Domnenko, Tatiana Ivanova, Maria Gantvorg

Proc. SPIE. 5249, Optical Design and Engineering

KEYWORDS: Mathematical modeling, Optical components, Optical design, Data modeling, Ray tracing, Software development, Zoom lenses, Chemical elements, Optical design software, Systems modeling

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Proceedings Article | 27 September 1999 Paper

Paper

Computer simulation of a partially coherent image based on the vector theory of diffraction

Vitaly Domnenko

Proc. SPIE. 3780, Optical Design and Analysis Software

KEYWORDS: Mathematical modeling, Superposition, Diffraction, Coherence imaging, Optical filters, Polarization, Fourier transforms, Image acquisition, Computer simulations, Systems modeling

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Proceedings Article | 25 February 1999 Paper

Paper

New approach to optical measurements of small objects with superresolution

Vadim Veiko, Nikolay Voznesensky, Vitaly Domnenko, Alexey Goussev, Tatyana Ivanova, Sergey Rodionov

Proc. SPIE. 3736, ICONO '98: Quantum Optics, Interference Phenomena in Atomic Systems, and High-Precision Measurements

KEYWORDS: Mathematical modeling, Visible radiation, Light sources, Super resolution, Spatial frequencies, Fourier transforms, Optical testing, Near field, Zernike polynomials, Near field optics

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Proceedings Article | 13 October 1998 Paper

Paper

New approach to analysis of subwavelength-sized secondary light sources

Nikolay Voznesensky, Vadim Veiko, Vitaly Domnenko, Alexey Goussev, Tatyana Ivanova, Sergey Rodionov

Proc. SPIE. 3467, Far- and Near-Field Optics: Physics and Information Processing

KEYWORDS: Visible radiation, Light sources, Super resolution, Polarization, Spatial frequencies, Fourier transforms, Near field scanning optical microscopy, Near field, Light wave propagation, Near field optics

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Proceedings Article | 11 April 1997 Paper

Paper

Method of computer-controlled microlens processing and testing

Sergey Rodionov, Vadim Veiko, Alexander Shakola, Vitaly Domnenko, Vadim Patlaty

Proc. SPIE. 3008, Miniaturized Systems with Micro-Optics and Micromechanics II

KEYWORDS: Optical components, Mirrors, Manufacturing, Zernike polynomials, Ray tracing, Process control, Microlens, Charge-coupled devices, Helium neon lasers, Optics manufacturing

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Showing 5 of 16 publications

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