Dr. Vitaly Domnenko
Staff R&D Engineer
SPIE Involvement:
Author
Area of Expertise:
computational lithography , optical image formation , resolution enhancement technique , source mask optimization , electro-magnetic solvers , rigorous simulations
Publications (16)

Proceedings Article | 4 April 2019 Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Computer simulations, 3D modeling, Photomasks, Extreme ultraviolet, Computational lithography, Optical proximity correction, Photoresist processing, Performance modeling, Resolution enhancement technologies

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Calibration, Manufacturing, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Photoresist processing

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Data modeling, Calibration, Polymers, Crystals, Materials processing, Manufacturing, 3D modeling, Numerical analysis, Solids, Photoresist processing

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Calibration, Manufacturing, Printing, Photomasks, Source mask optimization, SRAF, Optimization (mathematics), Photoresist processing, Semiconducting wafers

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Manufacturing, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Tolerancing, Array processing

Showing 5 of 16 publications
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