Diffractive optical elements (DOEs) of the kinoform type have been fabricated on DuPont photopolymer by using a gray scale mask technology. The fabricated DOEs have high diffraction efficiency and low noise. Compared with the conventional DOE fabrication the new process is rather simple and does not involve expensive capital equipment such as mask aligners and dry etching systems, and can be extended to mass production.
Micro-optics such as diffractive optics and computer generated holograms are essential components for modern optical design. To reduce their unit fabrication cost we describe a method of reproducing micro-optics in quantities. A true gray-level mask was fabricated in High Energy Beam Sensitive (HEBS)-Glass by means of a single e-beam direct write step. This gray-level mask was used in a optical contact aligner to print a multilevel Diffractive Optical Element (DOE) in a single optical exposure. A chemically assisted ion beam etching process has been used to transfer the DOE structure from the resist into the substrate.
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