Dr. Walter D. Mieher
at KLA Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Logic, Reflectivity, YAG lasers, Computer aided design, Semiconducting wafers, Direct write lithography

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Silicon, Reflectivity, Electroluminescence, Monte Carlo methods, Computer aided design, Semiconducting wafers, Direct write lithography

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Optical lithography, Etching, Spectroscopy, Reflectometry, Process control, Double patterning technology, Critical dimension metrology, Performance modeling, Systems modeling

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Photoresist processing, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Reticles, Metrology, Spectroscopy, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Wafer testing, Single crystal X-ray diffraction

Showing 5 of 6 publications
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