Dr. Walter D. Mieher Profile

Dr. Walter D. Mieher

at KLA Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 8 November 2012 Paper

Reflective electron-beam lithography performance for the 10nm logic node

Regina Freed, Thomas Gubiotti, Jeff Sun, Anthony Cheung, Jason Yang, Mark McCord, Paul Petric, Allen Carroll, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis

Proc. SPIE. 8522, Photomask Technology 2012

KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Logic, Reflectivity, YAG lasers, Computer aided design, Semiconducting wafers, Direct write lithography

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Proceedings Article | 21 March 2012 Paper

Reflective electron-beam lithography: progress toward high-throughput production capability

Regina Freed, Thomas Gubiotti, Jeff Sun, Francoise Kidwingira, Jason Yang, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis, Shy-Jay Lin, Wen-Chuan Wang

Proc. SPIE. 8323, Alternative Lithographic Technologies IV

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Silicon, Reflectivity, Electroluminescence, Monte Carlo methods, Computer aided design, Semiconducting wafers, Direct write lithography

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Proceedings Article | 24 March 2008 Paper

Opportunities and challenges for optical CD metrology in double patterning process control

Daniel Wack, John Hench, Leonid Poslavsky, John Fielden, Vera Zhuang, Walter Mieher, Ted Dziura

Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII

KEYWORDS: Metrology, Optical lithography, Etching, Spectroscopy, Reflectometry, Process control, Double patterning technology, Critical dimension metrology, Performance modeling, Systems modeling

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Proceedings Article | 24 March 2006 Paper

Scatterometry measurements of line end shortening structures for focus-exposure monitoring

Kelvin Hung, Yung Feng Cheng, Jie Wei Sun, Benjamin Szu-Min Lin, Steven Fu, Thaddeus Dziura, Marcelo Cusacovich, Walter Mieher

Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX

KEYWORDS: Lithography, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Photoresist processing, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

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Proceedings Article | 16 July 2002 Paper

Spectroscopic CD metrology for sub-100-nm lithography process control

Walter Mieher, Thaddeus Dziura, Xuemei Chen, Paola DeCecco, Ady Levy

Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI

KEYWORDS: Lithography, Reticles, Metrology, Spectroscopy, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Wafer testing, Single crystal X-ray diffraction

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Showing 5 of 6 publications

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