An optical modulation method based focus and level scheme is presented for optical projection lithography. The main
parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize
nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating
modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is
sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two
parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement
wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is obtained. Analytical result indicates that
focusing resolution at nanometer level can be realized.
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