Dr. Warren D. Grobman
Consultant
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 10 July 2003 Paper
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Lithography, Silicon, Manufacturing, Photomasks, Transistors, Field effect transistors, Optical proximity correction, Binary data, Device simulation, Resolution enhancement technologies

Proceedings Article | 12 July 2002 Paper
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Semiconductors, Lithography, Imaging systems, Manufacturing, Photomasks, Critical dimension metrology, Lithographic equipment, Resolution enhancement technologies, Phase shifts, Design for manufacturability

Proceedings Article | 12 July 2002 Paper
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Oxides, Polishing, Calibration, Metals, Copper, Resistance, Capacitance, Electromagnetism, Model-based design, Chemical mechanical planarization

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Data processing, Photomasks, Optical proximity correction, Data conversion, Semiconducting wafers, Binary data, Electronic design automation, Model-based design, Resolution enhancement technologies

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Polarization, Opacity, Quartz, Manufacturing, Printing, Photomasks, Integrated circuits, Neodymium, Phase shifts

Showing 5 of 6 publications
Conference Committee Involvement (5)
Design and Process Integration for Microelectronic Manufacturing IV
3 March 2005 | San Jose, California, United States
Design and Process Integration for Microelectronic Manufacturing III
26 February 2004 | Santa Clara, California, United States
Photomask Technology
9 September 2003 | Monterey, California, United States
Design and Process Integration for Microelectronic Manufacturing II
27 February 2003 | Santa Clara, CA, United States
Design and Process Integration for Microelectronics Manufacturing
6 March 2002 | Santa Clara, CA, United States
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