CONFERENCE PROCEEDINGS
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Wataru Nozaki
Engineer at Toppan Printing Co Ltd
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Publications (3)
Proceedings Article | 17 October 2008 Paper
Challenges for the quality control of assist features for 45nm node technology and beyond
Lin Wang, Todd Lukanc, Makoto Takahashi, Hung-Eil Kim, Khoi Phan, Taichi Yamazaki, Yosuke Kojima, Wataru Nozaki, Takashi Haraguchi, Yoshimitsu Okuda
Proceedings Volume 7122, 71220Z (2008) https://doi.org/10.1117/12.800916
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Optical proximity correction, Line edge roughness, Chromium, Photoresist processing, Resolution enhancement technologies, Reticles, SRAF
Proceedings Article | 11 March 2002 Paper
Optimization of ArF alternating phase-shifting mask structure for 100-nm node and inspection of phase defects
Kazuaki Chiba, Hiroyuki Takahashi, Wataru Nozaki, Shinji Akima, Susumu Nagashige, Yoshiro Yamada
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458319
KEYWORDS: Photomasks, Phase shifts, Inspection, Defect inspection, Critical dimension metrology, Defect detection, Process control, Reticles, Photomask technology, Control systems
Proceedings Article | 5 September 2001 Paper
Manufacturing and inspection of assist-bar-type OPC mask
Masayoshi Tsuzuki, Wataru Nozaki, Shinji Akima, Jun Yoshida, Yuko Oi, Yoshiro Yamada, Yuichi Matsuzawa
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438399
KEYWORDS: Photomasks, Inspection, Optical proximity correction, Manufacturing, Binary data, Semiconducting wafers, Defect inspection, Critical dimension metrology, Scanning electron microscopy, Defect detection
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