Mr. Wei-Ming He Profile

Wei-Ming He

Principal Engineer at Semiconductor Manufacturing International Corp

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Author

Publications (4)

Proceedings Article | 8 March 2016 Paper

Image-based overlay (IBO) target segment design on self-aligned patterning process

Lei Ye, Huayong Hu, Weiming He

Proceedings Volume 9778, 977828 (2016) https://doi.org/10.1117/12.2220017

KEYWORDS: Lithography, Image segmentation, Optical lithography, Overlay metrology, Metrology, Process control, Image processing, Carbon, Double patterning technology, Optical alignment, Photomasks, Etching, Semiconducting wafers

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Proceedings Article | 8 March 2016 Paper

Study on overlay AEI-ADI shift on contact layer of advanced technology node

Guogui Deng, Jingan Hao, Lihong Xiao, Bin Xing, Yuntao Jiang, Kaiting He, Qiang Zhang, Weiming He, Chang Liu, Yi-Shih Lin, Qiang Wu, Xuelong Shi

Proceedings Volume 9778, 97782C (2016) https://doi.org/10.1117/12.2220013

KEYWORDS: Overlay metrology, Process control, Etching, Chemical vapor deposition, Semiconductors, Integrated circuits, Critical dimension metrology, Stress analysis, Semiconducting wafers, Photoresist materials, Lithography, Oxides, Optical lithography

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Proceedings Article | 10 April 2015 Paper

Study on immersion lithography defectivity improvement in memory device manufacturing

Weiming He, Huayong Hu, Qiang Wu

Proceedings Volume 9424, 94242M (2015) https://doi.org/10.1117/12.2085457

KEYWORDS: Semiconducting wafers, Photomasks, Immersion lithography, Double patterning technology, Photoresist materials, Image processing, Manufacturing, Optical lithography, Photoresist developing, Natural surfaces

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Proceedings Article | 19 March 2015 Paper

Study on ADI CD bias correlating ABC function

Guogui Deng, Jingan Hao, Bin Xing, Yuntao Jiang, Gaorong Li, Qiang Zhang, Liwan Yue, Yanlei Zu, Huayong Hu, Chang Liu, Manhua Shen, Shijian Zhang, Weiming He, Nannan Zhang, Yi-Shih Lin, Qiang Wu, Xuelong Shi

Proceedings Volume 9424, 94242I (2015) https://doi.org/10.1117/12.2086093

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Electron beams, Metals, Optical proximity correction, Inspection, Process control, Electron microscopes, Semiconductors, Control systems

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