Dr. Weihua Lan Profile

Dr. Weihua Lan

at CIOMP

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Author

Publications (5)

Proceedings Article | 5 November 2015 Paper

Method of narcissus analysis in infrared system based on ASAP

Guodong Ren, Liang Zhang, Weihua Lan, Xiaodong Pan

Proceedings Volume 9795, 97952J (2015) https://doi.org/10.1117/12.2217581

KEYWORDS: Infrared radiation, Signal to noise ratio, Infrared imaging, Sensors, Ray tracing, Code v, Reflection, Black bodies, Interference (communication), Monte Carlo methods

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Proceedings Article | 7 February 2006 Paper

The packaging technology of optical switch arrays

Lina Zhao, Jingqiu Liang, Wei Dong, Anjie Ming, Weihua Lan, Xia Jin, Wangbin Zhu, Weibiao Wang, Zichun Le, Weiyou Chen, Lijun Wang

Proceedings Volume 6032, 60320O (2006) https://doi.org/10.1117/12.667874

KEYWORDS: Collimators, Mirrors, Optical switching, Microopto electromechanical systems, Packaging, Etching, Switches, Silicon, Optics manufacturing, Anisotropic etching

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Proceedings Article | 30 December 2004 Paper

Study on optical parts of MOEMS optical switch with low insertion loss

Anjie Ming, Jingqiu Liang, Weihua Lan, Wei Dong, Jinsong Yao, Weibiao Wang, Zichun Le, Weiyou Chen, Lijun Wang

Proceedings Volume 5641, (2004) https://doi.org/10.1117/12.570729

KEYWORDS: Silicon, Microopto electromechanical systems, Etching, Mirrors, Optical switching, Packaging, Micromirrors, Single mode fibers, Switches, Optical components

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Proceedings Article | 30 December 2004 Paper

The study on the compound x-ray refractive lens using LIGA technique

Jingqiu Liang, Zichun Le, Liangqiang Peng, Weibiao Wang, Weihua Lan, Anjie Ming, Futing Yi, Jian Ye, Bisheng Quan, Jinsong Yao, Ming Xuan, Lijun Wang

Proceedings Volume 5641, (2004) https://doi.org/10.1117/12.570760

KEYWORDS: X-rays, Polymethylmethacrylate, X-ray lithography, Photomasks, X-ray technology, Photoresist materials, Manufacturing, Electroplating, X-ray optics, Absorption

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Proceedings Article | 20 August 2004 Paper

The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography

Jingqiu Liang, Zichun Le, Weibiao Wang, Liangqiang Peng, Weihua Lan, Anjie Ming, Jian Ye, Bisheng Quan, Jinsong Yao, Ming Xuan, Lijun Wang

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557781

KEYWORDS: Photomasks, Excimer lasers, Laser ablation, X-rays, X-ray lithography, Ultraviolet radiation, Photoresist materials, Polymers, Gold, Scanning electron microscopy

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