CONFERENCE PROCEEDINGS
Advanced Search
Wen-Hao Wu
at National Yang Ming Chiao Tung Univ.
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 4 December 2008 Paper
Use of spin-on-hard mask materials for nano scale patterning technology
Wen-Hao Wu, Edward Chang, Hwan-Sung Cheon, Sang Kyun Kim, Hyeon Mo Cho, Kyong-Ho Yoon, Jong Seob Kim, Tuwon Chang, Seongho Shin
Proceedings Volume 7140, 71402Q (2008) https://doi.org/10.1117/12.804695
KEYWORDS: Etching, Silicon, Scanning electron microscopy, Photoresist materials, Oxygen, Photomasks, Nanotechnology, Plasma, Optical lithography, Carbon
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top