Dr. Wen-Shiang Liao Profile

Dr. Wen-Shiang Liao

at United Microelectronics Corp

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Author

Publications (7)

Proceedings Article | 31 March 2008 Paper

Non-topcoat resist design for immersion process at 32-nm node

Steven Wu, Aroma Tseng, Bill Lin, Chun Chi Yu, Bo-Jou Lu, Wen-Shiang Liao, Deyan Wang, Vaishali Vohra, Cheng Bai Xu, Stefan Caporale, George Barclay

Proceedings Volume 6923, 692307 (2008) https://doi.org/10.1117/12.775542

KEYWORDS: Electron beam lithography, Photoresist processing, Polymers, Semiconducting wafers, Lithography, Immersion lithography, Water, Surface properties, Surface roughness, Thin film coatings

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Proceedings Article | 26 March 2008 Paper

Improvement of 90nm technology VIA photo alignment through TiN hard mask removing above previous photo alignment mark area

Wen-Shiang Liao, Hsin-Hung Lin, Yu-Huan Liu, Mao-Chyuan Tang, Sheng-Yi Huang, Cheng-Han Wu, Yue-Gie Liaw, Tung-Hung Chen, Tommy Shih, Kun-Ming Chen

Proceedings Volume 6923, 69233Y (2008) https://doi.org/10.1117/12.772286

KEYWORDS: Optical alignment, Tin, Photomasks, Copper, Semiconducting wafers, Signal detection, Scanners, Optical lithography, Metals, Logic

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Proceedings Article | 21 March 2008 Paper

An ultra-narrow FinFET poly-Si gate structure fabricated with 193nm photolithography and in-situ PR/BARC and TEOS hard mask etching

Wen-Shiang Liao, Cheng-Han Wu, Mao-Chyuan Tang, Sheng-Yi Huang, Tommy Shih, Yue-Gie Liaw, Kun-Ming Chen, Tung-Hung Chen, Huan-Chiu Tsen, Lee Chung

Proceedings Volume 6921, 69212N (2008) https://doi.org/10.1117/12.769591

KEYWORDS: Etching, Plasma, Plasma etching, Electrodes, Photomasks, Oxides, Optical lithography, Scanners, Scanning electron microscopy

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Proceedings Article | 5 April 2007 Paper

Study on micro-bubble defect induced by RRC coating

Yu-Huan Liu, Wen-Shiang Liao, Hsin-Hung Lin, Chin-Jung Chen, C. C. Huang

Proceedings Volume 6518, 65184L (2007) https://doi.org/10.1117/12.711933

KEYWORDS: Coating, Semiconducting wafers, Scanning electron microscopy, Inspection, Etching, Photomasks, Temperature metrology, Metrology, Process control, Optical lithography

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Proceedings Article | 27 March 2007 Paper

A thin FinFET Si-fin body structure fabricated with 193-nm scanner photolithography and composite hard mask etching technique upon bulk-Si substrate

Wen-Shiang Liao, Yu-Huan Liu, Wen-Tung Chang, Tung-Hung Chen, Tommy Shih, Huan-Chiu Tsen, Lee Chung

Proceedings Volume 6520, 65204N (2007) https://doi.org/10.1117/12.714391

KEYWORDS: Photomasks, Composites, Etching, Plasma etching, Scanners, Silicon, Optical lithography, Plasma, 193nm lithography

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Proceedings Article | 27 March 2007 Paper

A thick CESL stressed ultra-small (Lg=40-nm) SiGe-channel MOSFET fabricated with 193-nm scanner lithography and TEOS hard mask etching

Wen-Shiang Liao, Tung-Hung Chen, Hsin-Hung Lin, Wen-Tung Chang, Tommy Shih, Huan-Chiu Tsen, Lee Chung

Proceedings Volume 6520, 65204P (2007) https://doi.org/10.1117/12.708935

KEYWORDS: Etching, Photomasks, Oxides, Scanners, Lithography, Plasma, Field effect transistors, 193nm lithography, Plasma etching, Optical lithography

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Proceedings Article | 14 March 2006 Paper

A high aspect ratio Si-fin FinFET fabricated with 193nm scanner photolithography and thermal oxide hard mask etching techniques

Wen-Shiang Liao

Proceedings Volume 6156, 615612 (2006) https://doi.org/10.1117/12.659648

KEYWORDS: Oxides, Plasma etching, Optical lithography, Etching, Scanners, Photoresist materials, Plasma, Scanning electron microscopy, Photomasks

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Showing 5 of 7 publications

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