Dr. Wenhua Zhu
Postdoc at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Logic, Phase shift keying, Lens design, 3D modeling, Phase imaging, Photomasks, Extreme ultraviolet, Charge-coupled devices, Phase measurement, Phase shifts

Proceedings Article | 20 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Microscopes, Phase contrast, Phase imaging, Objectives, Photomasks, Extreme ultraviolet, Phase measurement, Zone plates, Phase shifts, Near field optics

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Image processing, Scanners, Scanning electron microscopy, Projection systems, Vibration isolation, Semiconducting wafers, Camera shutters

Proceedings Article | 4 June 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical design, Phase shifting, Interferometry, Phase interferometry, Photomasks, Extreme ultraviolet, Reconstruction algorithms, Phase measurement, Phase shifts, Diffraction gratings

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Monochromatic aberrations, Optical design, Sensors, Interferometry, Wavefronts, Multiplexing, Optical alignment, Diffraction gratings, Shearing interferometers

Showing 5 of 13 publications
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