Dr. Wenhui Wang Profile

Dr. Wenhui Wang

Engineer

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 26 April 2017 Presentation

Design grid optimization for OPC of silicon photonics (Conference Presentation)

Wenhui Wang, Xiaochi Chen, Lei Sun, Alexander Piggott, Jelena Vuckovic, Jongwook Kye

Proc. SPIE. 10147, Optical Microlithography XXX

KEYWORDS: Optical lithography, Sun, Optical proximity correction, High volume manufacturing, Silicon photonics, Current controlled current source

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Proceedings Article | 28 March 2017 Paper

High throughput and dense sampling metrology for process control

Lei Sun, Tsunehito Kohyama, Kuniaki Takeda, Hiroto Nozawa, Yuji Asakawa, Taher Kagalwala, Granger Lobb, Frank Mont, Xintuo Dai, Shyam Pal, Wenhui Wang, Jongwook Kye, Francis Goodwin

Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI

KEYWORDS: Wafer-level optics, Lithography, Metrology, Inspection, Optical metrology, Process control, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Optics manufacturing, Defect inspection

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Proceedings Article | 24 March 2016 Paper

LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL)

Nihar Mohanty, Richard Farrell, Cheryl Periera, Kal Subhadeep, Elliott Franke, Jeffrey Smith, Akiteru Ko, Anton DeVilliers, Peter Biolsi, Lei Sun, Genevieve Beique, Erik Hosler, Erik Verdujn, Wenhui Wang, Cathy Labelle, Ryoung-han Kim

Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V

KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Ions, Chemistry, Extreme ultraviolet, Line edge roughness, Back end of line, Front end of line

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Proceedings Article | 18 March 2016 Paper

Comparison of left and right side line edge roughness in lithography

Lei Sun, Nicole Saulnier, Genevieve Beique, Erik Verduijn, Wenhui Wang, Yongan Xu, Hao Tang, Yulu Chen, Ryoung-han Kim, John Arnold, Nelson Felix, Matthew Colburn

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Semiconductors, Lithography, Metrology, Roads, Scattering, Etching, Inspection, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

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Proceedings Article | 15 March 2016 Paper

Line edge roughness frequency analysis for SAQP process

Lei Sun, Xiaoxiao Zhang, Shimon Levi, Adam Ge, Hua Zhou, Wenhui Wang, Navaneetha Krishnan, Yulu Chen, Erik Verduijn, Ryoung-han Kim

Proc. SPIE. 9780, Optical Microlithography XXIX

KEYWORDS: Lithography, Optical lithography, Dielectrophoresis, Line width roughness, Semiconductor manufacturing, Line edge roughness, Chemical mechanical planarization

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SPIE Journal Paper | 13 July 2015

Line edge roughness frequency analysis during pattern transfer in semiconductor fabrication

Lei Sun, Wenhui Wang, Genevieve Beique, Min Sung, Obert Wood, Ryoung-Han Kim

JM3 Vol. 14 Issue 03

KEYWORDS: Line edge roughness, Line width roughness, Semiconductors, Reactive ion etching, Double patterning technology, Lithography, Oxides, Extreme ultraviolet lithography, Optical inspection, Visualization

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Proceedings Article | 19 March 2015 Paper

Application of frequency domain line edge roughness characterization methodology in lithography

Lei Sun, Wenhui Wang, Genevieve Beique, Obert Wood, Ryoung-Han Kim

Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX

KEYWORDS: Semiconductors, Lithography, Visualization, Etching, Optical inspection, Line width roughness, Line edge roughness, Neodymium, Semiconducting wafers, Edge roughness

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Proceedings Article | 13 March 2015 Paper

EUV processing and characterization for BEOL

Nicole Saulnier, Yongan Xu, Wenhui Wang, Lei Sun, Lin Lee Cheong, Romain Lallement, Genevieve Beique, Bassem Hamieh, John Arnold, Nelson Felix, Matthew Colburn

Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI

KEYWORDS: Lithography, Etching, Scanners, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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Proceedings Article | 2 April 2014 Paper

Mean offset optimization for multi-patterning overlay using Monte Carlo simulation method

Wenhui Wang, Liping Cui, Lei Sun, Ryoung-Han Kim

Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII

KEYWORDS: Lithography, Optical lithography, Manufacturing, Control systems, Monte Carlo methods, Extreme ultraviolet lithography, Double patterning technology, Optical alignment, Tolerancing, Overlay metrology

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SPIE Journal Paper | 17 December 2013

Review of resist-based flare measurement methods for extreme ultraviolet lithography

Lei Sun, Obert Wood, Erik Verduijn, Mandeep Singh, Wenhui Wang, Ryoung-Han Kim, Pawitter Mangat, Hui Peng Koh, Harry Levinson

JM3 Vol. 12 Issue 04

KEYWORDS: Point spread functions, Modulation transfer functions, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Light scattering, Scattering, Photomasks, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 17 May 2011 Paper

Ultra fast all-optical fiber pressure sensor for blast event evaluation

Nan Wu, Wenhui Wang, Ye Tian, Christopher Niezrecki, Xingwei Wang

Proc. SPIE. 7753, 21st International Conference on Optical Fiber Sensors

KEYWORDS: Multimode fibers, Optical fibers, Ultrafast phenomena, Fabry–Perot interferometers, Silica, Sensors, Silicon, Fiber optics sensors, Data processing, Traumatic brain injury

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Proceedings Article | 16 May 2011 Paper

A miniature pressure sensor for blast event evaluation

Nan Wu, Wenhui Wang, Ye Tian, Christopher Niezrecki, Xingwei Wang

Proc. SPIE. 8029, Sensing Technologies for Global Health, Military Medicine, Disaster Response, and Environmental Monitoring; and Biometric Technology for Human Identification VIII

KEYWORDS: Microelectromechanical systems, Fabry–Perot interferometers, Polishing, Fiber optics, Sensors, Interfaces, Silicon, Fiber optics sensors, Wave propagation, Traumatic brain injury

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Proceedings Article | 27 April 2010 Paper

Label-free detection of biomolecules using a tapered optical fiber sensor

Ye Tian, Wenhui Wang, Armand Chery, Nan Wu, Charles Guthy, Xingwei Wang

Proc. SPIE. 7673, Advanced Environmental, Chemical, and Biological Sensing Technologies VII

KEYWORDS: Optical fibers, Refractive index, Cladding, Sensors, Biosensors, Structured optical fibers, Single mode fibers, 3D modeling, Fiber optics sensors, Tapered optical fibers

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Proceedings Article | 27 April 2010 Paper

Surface-enhanced Raman scattering on optical material fabricated by femtosecond laser

Wenhui Wang, Haibin Huo, Nan Wu, Mengyan Shen, Charles Guthy, Xingwei Wang

Proc. SPIE. 7673, Advanced Environmental, Chemical, and Biological Sensing Technologies VII

KEYWORDS: Optical fibers, Nanostructures, Femtosecond phenomena, Silica, Sensors, Quartz, Scanning electron microscopy, Raman spectroscopy, Raman scattering, Nanolithography

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Proceedings Article | 20 April 2010 Paper

Theoretical analysis of a novel ultrasound generator on an optical fiber tip

Nan Wu, Wenhui Wang, Ye Tian, Charles Guthy, Xingwei Wang

Proc. SPIE. 7677, Fiber Optic Sensors and Applications VII

KEYWORDS: Gold, Optical fibers, Nanoparticles, Ultrasonography, Transform theory, Mie scattering, Photoacoustic spectroscopy, Acoustics, Pulsed laser operation, Absorption

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Proceedings Article | 20 April 2010 Paper

Simulation of a novel ultrasound generator-receiver on a single optical fiber

Xingwei Wang, Chunyang Liu, Nan Wu, Wenhui Wang, Charles Guthy, Ye Tian, Chengyu Cao

Proc. SPIE. 7677, Fiber Optic Sensors and Applications VII

KEYWORDS: Gold, Optical fibers, Nanoparticles, Ultrasonography, Interfaces, Receivers, Single mode fibers, Finite element methods, Optical simulations, Pulsed laser operation

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Proceedings Article | 20 April 2010 Paper

Dynamic test of an acoustic/pressure sensor with precise cavity length control

Wenhui Wang, Nan Wu, Ye Tian, Charles Guthy, Xingwei Wang, Christopher Niezrecki

Proc. SPIE. 7677, Fiber Optic Sensors and Applications VII

KEYWORDS: Microelectromechanical systems, Laser sources, Optical sensors, Interferometers, Sensors, Calibration, Silicon, Fiber optics sensors, Sensor performance, Sensor calibration

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Proceedings Article | 24 February 2010 Paper

Thin film thickness variation measurement using dual LEDs and reflectometric interference spectroscopy model in biosensor

Yunfeng Ling, Nan Wu, Wenhui Wang, Leslie Farris, Byungki Kim, Xingwei Wang, Melisenda McDonald

Proc. SPIE. 7559, Optical Fibers and Sensors for Medical Diagnostics and Treatment Applications X

KEYWORDS: Thin films, Light emitting diodes, Polymethylmethacrylate, Silica, Sensors, Spectrometers, Biosensors, Atomic force microscopy, Reflectance spectroscopy, Thin film devices

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Proceedings Article | 13 February 2010 Paper

Label-free detection of biomolecules using LED technology

Nan Wu, Wenhui Wang, Yunfeng Ling, Leslie Farris, Byungki Kim, Melisenda McDonald, Xingwei Wang

Proc. SPIE. 7574, Nanoscale Imaging, Sensing, and Actuation for Biomedical Applications VII

KEYWORDS: Light sources, Proteins, Light emitting diodes, Polymethylmethacrylate, Reflection, Sensors, Silicon, Reflectivity, Interferometry, Biosensors

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Proceedings Article | 4 October 2007 Paper

Nanoscale and manufacturable sensing tip for biomedical applications

Xingwei Wang, Wenhui Wang

Proc. SPIE. 6759, Smart Biomedical and Physiological Sensor Technology V

KEYWORDS: Biosensing, Biomedical optics, Sensors, Etching, Manufacturing, Nanoprobes, Fiber optics sensors, Near field scanning optical microscopy, Biological research, Nanolithography

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Proceedings Article | 10 January 2005 Paper

Mirror-integrated arrayed-waveguide grating on silicon-on-insulator

Kemiao Jia, Wenhui Wang, Yanzhe Tang, Yirong Yang, Jianyi Yang, Xiaoqing Jiang, Yaming Wu, Minghua Wang, Yuelin Wang

Proc. SPIE. 5623, Passive Components and Fiber-based Devices

KEYWORDS: Mirrors, Optical lithography, Waveguides, Silicon, Photomasks, Integrated optics, Dense wavelength division multiplexing, Demultiplexers, Phased array optics, Light wave propagation

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SPIE Journal Paper | 1 November 2004

Design and fabrication of multimode interference coupler with strong confinement structure on silicon-on-insulator

Yanzhe Tang, Wenhui Wang, Yaming Wu, Jianyi Yang, Yuelin Wang

OE Vol. 43 Issue 11

KEYWORDS: Waveguides, Brain-machine interfaces, Silicon, Optical lithography, Silica, Single mode fibers, Structural design, Etching, Semiconducting wafers, Information science

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