Dr. Werner Gillijns
Researcher Optical Lithography at imec
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reticles, Etching, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology

Proceedings Article | 25 March 2020 Presentation
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Nanotechnology, Two photon polymerization, Metals, Adaptive optics, Optical proximity correction, Mask making, Nanofabrication, Electronic design automation, Standards development, Vestigial sideband modulation

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

Showing 5 of 24 publications
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