Wesley R. Erck
President at Wes Erck & Associates
SPIE Involvement:
Author
Area of Expertise:
Photomask design , SEMI P10 , Photomask ordering
Publications (2)

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790U (2009) https://doi.org/10.1117/12.824271
KEYWORDS: Photomasks, Semiconducting wafers, Manufacturing, Yield improvement, Prototyping, Computing systems, Software development, Error analysis, Instrument modeling, Product engineering

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518277
KEYWORDS: Photomasks, Data modeling, Semiconducting wafers, Manufacturing, Databases, Instrument modeling, Design for manufacturability, Image processing, Inspection, Performance modeling

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