Dr. William Chu Profile

Dr. William Chu

Lithography Manager at IBM Microelectronics Div

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Author

Publications (8)

Proceedings Article | 5 April 2007 Paper

Blossom overlay metrology implementation

C. Ausschnitt, W. Chu, D. Kolor, J. Morillo, J. Morningstar, W. Muth, C. Thomison, R. Yerdon, L. Binns, P. Dasari, H. Fink, N. Smith, G. Ananew

Proceedings Volume 6518, 65180G (2007) https://doi.org/10.1117/12.712669

KEYWORDS: Overlay metrology, Metrology, Photomasks, Imaging systems, Semiconducting wafers, Lithography, Manufacturing, Imaging metrology, Scanning electron microscopy, Optical lithography

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Proceedings Article | 24 March 2006 Paper

Characterization of across-device linewidth variation (ADLV) for 65-nm logic SRAM using CDSEM and linewidth roughness algorithms

W. Chu, C. Radens, B. Dirahoui, I. Grauer, D. Samuels, S. Credendino, A. Nomura, R. Cornell

Proceedings Volume 6152, 61520Y (2006) https://doi.org/10.1117/12.663446

KEYWORDS: Critical dimension metrology, Transistors, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Resolution enhancement technologies, Logic, Line width roughness, Transmission electron microscopy, Printing

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Proceedings Article | 21 March 2006 Paper

Lithography budget analysis at the process module level

Colin Brodsky, William Chu

Proceedings Volume 6154, 61543Y (2006) https://doi.org/10.1117/12.659458

KEYWORDS: Photomasks, Critical dimension metrology, Reactive ion etching, Lithography, Semiconducting wafers, Optical lithography, Optical proximity correction, Error analysis, Scanners, Etching

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Proceedings Article | 14 March 2006 Paper

Meeting critical gate linewidth control needs at the 65 nm node

Arpan Mahorowala, Scott Halle, Allen Gabor, William Chu, Alexandra Barberet, Donald Samuels, Amr Abdo, Len Tsou, Wendy Yan, Seiji Iseda, Kaushal Patel, Bachir Dirahoui, Asuka Nomura, Ishtiaq Ahsan, Faisal Azam, Gary Berg, Andrew Brendler, Jeffrey Zimmerman, Tom Faure

Proceedings Volume 6156, 61560M (2006) https://doi.org/10.1117/12.659427

KEYWORDS: Critical dimension metrology, Etching, Semiconducting wafers, Photomasks, Optical proximity correction, Lithography, Cadmium, Reticles, Control systems, Immersion lithography

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Proceedings Article | 30 July 2002 Paper

Subresolution assist feature implementation for high-performance logic gate-level lithography

Allen Gabor, James Bruce, William Chu, Richard Ferguson, Carlos Fonseca, Ronald Gordon, Kenneth Jantzen, Mukesh Khare, Mark Lavin, Woo-Hyeong Lee, Lars Liebmann, Karl Muller, Jed Rankin, Patrick Varekamp, Franz Zach

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474591

KEYWORDS: SRAF, Optical proximity correction, Logic, Binary data, Lithography, Model-based design, Image enhancement, Printing, Manufacturing, Lithographic illumination

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Proceedings Article | 14 September 2001 Paper

Optimizing style options for subresolution assist features

Lars Liebmann, James Bruce, William Chu, Michael Cross, Ioana Graur, Joshua Krueger, William Leipold, Scott Mansfield, Anne McGuire, Dianne Sundling

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435690

KEYWORDS: SRAF, Photomasks, Model-based design, Manufacturing, Optical proximity correction, Computer aided design, Lithography, Inspection, Semiconducting wafers, Data modeling

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Proceedings Article | 14 September 2001 Paper

CD control of low-k-factor step-and-scan lithography

Christopher Ausschnitt, Christopher Progler, William Chu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435729

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Control systems, Metrology, Modulation, Photomasks, Chlorine, Feedback control, Scanning electron microscopy

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Proceedings Article | 2 June 2000 Paper

Process window metrology

Christopher Ausschnitt, William Chu, Linda Hadel, Hok Ho, Peter Talvi

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386468

KEYWORDS: Lithography, Metrology, Finite element methods, Semiconducting wafers, Process control, Chlorine, Scanning electron microscopy, Critical dimension metrology, Photomasks, Patents

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Showing 5 of 8 publications

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